Non-reactively sputtered ultra-high temperature Hf-C and Ta-C coatings

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• 作者：H. Lasfargues^a ; ^{heloise.lasfargues@tuwien.ac.at} ; T. Glechner^a ; C.M. Koller^a ; V. Paneta^b ; D. Primetzhofer^b ; S. Kolozsvá ; ri^c ; D. Holec^d ; H. Riedl^a ; P.H. Mayrhofer^a
• 关键词：HfC ; TaC ; Non-reactive sputter deposition ; Vacancies ; UHTC ; Density Functional Theory (DFT)
• 刊名：Surface and Coatings Technology
• 出版年：2017
• 出版时间：15 January 2017
• 年：2017
• 卷：309
• 期：Complete
• 页码：436-444
• 全文大小：1255 K
• 卷排序：309

文摘

Crystalline HfCy and TaCy coatings were non-reactively sputter deposited. The carbon deficiency can be controlled through the deposition parameters. Extremely high hardness values are obtained for both systems. The presence of a h-Ta2C fraction in TaCy coatings prevents grain coarsening. DFT calculations prove a stabilization of C-deficient fcc-phases at UHT.