Gate Drain Underlapped-PNIN-GAA-TFET for Comprehensively Upgraded Analog/RF Performance
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文摘
Gate drain underlapped-PNIN-GAA-TFET has been proposed. The major impediments of TFET such as the inherent ambipolar behaviour, low ION and high threshold voltage are conquered. Improved analog and RF Figure of merits are acquired by integrating GDU and PNIN engineering schemes. Proposed device is suitable for low power and high-speed applications.
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