Robust Graphene Membranes in a Silicon Carbide Frame

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• 作者：Daniel Waldmann ; Benjamin Butz ; Sebastian Bauer ; Jan M. Englert ; Johannes Jobst ; Konrad Ullmann ; Felix Fromm ; Maximilian Ammon ; Michael Enzelberger ; Andreas Hirsch ; Sabine Maier ; Patrik Schmuki ; Thomas Seyller ; Erdmann Spiecker ; Heiko B. Weber
• 刊名：ACS Nano
• 出版年：2013
• 出版时间：May 28, 2013
• 年：2013
• 卷：7
• 期：5
• 页码：4441-4448
• 全文大小：1417K
• 年卷期：v.7,no.5(May 28, 2013)
• ISSN：1936-086X

文摘

We present a fabrication process for freely suspended membranes consisting of bi- and trilayer graphene grown on silicon carbide. The procedure, involving photoelectrochemical etching, enables the simultaneous fabrication of hundreds of arbitrarily shaped membranes with an area up to 500 渭m² and a yield of around 90%. Micro-Raman and atomic force microscopy measurements confirm that the graphene layer withstands the electrochemical etching and show that the membranes are virtually unstrained. The process delivers membranes with a cleanliness suited for high-resolution transmission electron microscopy (HRTEM) at atomic scale. The membrane, and its frame, is very robust with respect to thermal cycling above 1000 掳C as well as harsh acidic or alkaline treatment.

Keywords:

epitaxial graphene; membranes; photo-assisted etching; Raman spectroscopy; transmission electron microscopy