Electrodeposition of Polyphasic Films of Zinc Oxi Sulfide from DMSO onto n-InP(100) and n-InP(111) Single Crystals in the Presence of Zinc Salt, Thiourea, and Dissolved Molecular Oxygen
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In the present work, we studied the electrodeposition of zinc oxide sulfide films onto monocrystalline n-InP(ntities/onemacr.gif">ntities/onemacr.gif">ntities/onemacr.gif">) and (100) substrates starting from the combined reduction of thiourea, as a sulfide ion source, andmolecular oxygen in the presence of zinc ions using DMSO as the solvent. The possible reactions involvedin the formation of the films were studied through cyclic voltammetry. Independent of electrodepositionpotential or the crystalline plane employed, a peculiar honeycomb bee morphology was observed by SEM inthe deposits. The films formed on both crystalline planes showed a variable composition that can be adjustedby changing the electrodeposition potential. The crystalline characterization of the films was studied throughRHEED. In agreement with the atomic ratio obtained by EDS, the patterns obtained showed that the as-grown deposits are basically formed by ZnO, ZnO2, and ZnS. The polyphasic film composition can berepresented by [(ZnO)a(ZnO2)b(ZnS)c], and a general formation reaction for this class of mixtures is proposed.The analysis of their optical properties for the polyphasic films formed onto FTO electrode gave a band gapof 3.46 eV, meaning that the films can be considered as a good alternative to a layer window in solar cells.
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