Photoresponsive Surface Molecularly Imprinted Poly(ether sulfone) Microfibers

详细信息    查看全文

• 作者：Dongsheng Wang ; Xiaoxue Zhang ; Shengqiang Nie ; Weifeng Zhao ; Yi Lu ; Shudong Sun ; Changsheng Zhao
• 刊名：Langmuir
• 出版年：2012
• 出版时间：September 18, 2012
• 年：2012
• 卷：28
• 期：37
• 页码：13284-13293
• 全文大小：528K
• 年卷期：v.28,no.37(September 18, 2012)
• ISSN：1520-5827

文摘

In the present study, photoresponsive surface molecularly imprinted poly(ether sulfone) microfibers are prepared via nitration reaction, the wet-spinning technique, surface nitro reduction reaction, and surface diazotation reaction for the selectively photoregulated uptake and release of 4-hydrobenzoic acid. The prepared molecularly imprinted microfibers show selective binding to 4-HA under irradiation at 450 nm and release under irradiation at 365 nm. The simple, convenient, effective, and productive method for the preparation of azo-containing photoresponsive material is also applied to the modification of polysulfone and poly(ether ether ketone). All three benzene-ring-containing polymers show significant photoresponsibility after the azo modification.