Controlled Evaporative Self-Assembly of Poly(acrylic acid) in a Confined Geometry for Fabricating Patterned Polymer Brushes

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• 作者：Yonghong Men ; Peng Xiao ; Jing Chen ; Jun Fu ; Youju Huang ; Jiawei Zhang ; Zhengchao Xie ; Wenqin Wang ; Tao Chen
• 刊名：Langmuir
• 出版年：2014
• 出版时间：April 29, 2014
• 年：2014
• 卷：30
• 期：16
• 页码：4863-4867
• 全文大小：391K
• 年卷期：v.30,no.16(April 29, 2014)
• ISSN：1520-5827

文摘

A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments.