设为首页
收藏本站
网站地图
|
English
|
公务邮箱
About the library
Background
History
Leadership
Organization
Readers' Guide
Opening Hours
Collections
Help Via Email
Publications
Electronic Information Resources
Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation
详细信息
查看全文
作者:
Al
fred
o MameliYinghuan Kuang
;
Morteza Aghaee
;
Chaitanya K. Ande
;
Bora KarasuluMariadriana Creatore
;
Adriaan J. M. Mackus
;
Wilhelmus M. M. Kessels
;
Fred
Roozeboom
刊名:Chemistry of Materials
出版年:2017
出版时间:February 14, 2017
年:2017
卷:29
期:3
页码:921-925
全文大小:376K
ISSN:1520-5002
文摘
NGLC 2004-2010.National Geological Library of China All Rights Reserved.
Add:29 Xueyuan Rd,Haidian District,Beijing,PRC. Mail Add: 8324 mailbox 100083
For exchange or info please contact us via
email
.