Mechanism of Production of CN(X2Σ+) Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar

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• 作者：Haruhiko Ito (1)
  Katsuaki Koshimura (1)
  Ayumi Yamamoto (1)
  Hiroki Tsudome (1)
  Nurul Izzaty Binti Zamri (1)
  Hitoshi Araki (1)
  Akira Wada (1)
  
• 关键词：Microwave plasma CVD ; Laser spectroscopy ; Amorphous carbon nitride ; CN radicals ; Ar metastables
• 刊名：Plasma Chemistry and Plasma Processing
• 出版年：2014
• 出版时间：July 2014
• 年：2014
• 卷：34
• 期：4
• 页码：837-851
• 全文大小：
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• 作者单位：Haruhiko Ito (1)
  Katsuaki Koshimura (1)
  Ayumi Yamamoto (1)
  Hiroki Tsudome (1)
  Nurul Izzaty Binti Zamri (1)
  Hitoshi Araki (1)
  Akira Wada (1)
  
  1. Department of Chemistry, Nagaoka University of Technology, Nagaoka, 940-2188, Japan
  
• ISSN：1572-8986

文摘

CN(X2Σ+) radicals were produced from the dissociative excitation reaction of CH3CN with the microwave discharge flow of Ar. The mechanism of the production of these radicals was studied on the basis of a combined analysis of the laser-induced fluorescence (LIF) and electrostatic-probe measurements. The densities of CN(X2Σ+) and the metastable states of Ar, Ar(3P0,2), were determined by observing the LIF spectra of the CN(A2Πi–X2Σ+), Ar(3P1-sup class="a-plus-plus">3P2), and Ar(3P1-sup class="a-plus-plus">3P0) transitions. A chemical–kinetic analysis of the above densities together with the temperature and the density of free electrons was carried out to elucidate that the dominant mechanism of the production of CN(X2Σ+) is the energy transfer from Ar(3P0,2). The rate constant of the production of CN(X2Σ+) is determined to be (4.6?±?0.4)?×?10?7?m3?molecule??s?. Based on the results of the present and our previous studies (Ito et al. in Diam Relat Mater 24:121-25, 2012) , a quantitative description was made on the incorporation of N atoms into hydrogenated amorphous carbon nitride films formed in the present reaction system.