Effects of cobalt and cobalt oxide buffer layers on nucleation and growth of hot filament chemical vapor deposition diamond films on silicon (100)
详细信息    查看全文
  • 作者:Mushtaq Ahmad Dar (1) (3)
    Hatem Abuhimd (2)
    Iftikhar Ahmad (1)
    Mohammad Islam (1)
    Mohammad Rezaul Karim (1)
    Hyung-Shik Shin (3)
  • 关键词:Hot Filament Chemical Vapor Deposition (HFCVD) ; CVD Diamond ; Cobalt ; Cobalt Oxide ; Filament ; substrate Distance
  • 刊名:Korean Journal of Chemical Engineering
  • 出版年:2014
  • 出版时间:July 2014
  • 年:2014
  • 卷:31
  • 期:7
  • 页码:1271-1275
  • 全文大小:680 KB
  • 参考文献:1. M.A. Dar, Y.-S. Kim, S.G. Ansari, H.-i. Kim,_G. Khang, C.V. Chiem and H.-S. Shin, / Korean J. Chem. Eng., 22, 770 (2005). CrossRef
    2. H. Toyota, S. Nomura, Y. Takahashi and S. Mukasa, / Dia. Rel. Mater., 17, 1902 (2008). CrossRef
    3. M. Kamo, Y. Sato, S. Matsumoto and N. Setaka, / J. Cryst. Growth, 62, 642 (1983). CrossRef
    4. F. Akaisuka, Y. Hirose and K. Komaki, / Jpn. J. Appl. Phys., 27, L1600 (1988). CrossRef
    5. D. S. Whitmell and R. Williamson, / Thin Sol. Films, 35, 255 (1976). CrossRef
    6. T. Mori and Y. Namba, / J. Vac. Sci. Technol. A, 1, 23 (1983). CrossRef
    7. P. R. Buerki and S. Leutwyler, / J. Appl. Phys., 69, 3739 (1991). CrossRef
    8. J.C. Angus, H. A. Will and W. S. Stanko, / J. Appl. Phys., 39, 2915 (1968). CrossRef
    9. C.M. Sung and M. F. Tai, / Int. J. Refract. Met. Hard Mater., 15, 237 (1997). CrossRef
    10. A. T. Collins and P. M. Spear, / J. Phys. D, 15, L183 (1982). CrossRef
    11. K. Mitsuda, Y. Kojima, T. Yoshida and K. Akashi, / J. Mater. Sci., 22, 1557 (1987). CrossRef
    12. S. Yugo, T. Kanai, T. Kimura and T. Muto, / Appl. Phy. Lett., 58, 1036 (1991). CrossRef
    13. B.R. Stoner, G.-H. M. Ma, S. D. Wolter and J. T. Glass, / Phys. Rev. B, 45, 11067 (1992). CrossRef
    14. T. P. Ong, F. Xiong, R. P.H. Chang and C.W. White, / J. Mater. Res., 7, 2429 (1992). CrossRef
    15. M. Ihra, H. Komiyama and T. Okubo, / Appl. Phys. Lett., 65, 1192 (1994). CrossRef
    16. K. Kobayashi, N. Mutsukura and Y. Machi, / Mater. Manuf. Processes, 7, 395 (1992). CrossRef
    17. Z. Feng, K. Komvopopulos, I.G. Brown and D. B. Bogy, / J. Appl. Phys., 74, 2841 (1993). CrossRef
    18. M.A. Dar, S.G. Ansari, Z. A. Ansari, H. Umemoto, Y. S. Kim, H. K. Seo, G. S. Kim, E. K. Suh and H. S. Shin, / Int. J. Refract. Met. Hard Mater., 24, 418 (2006). CrossRef
    19. D.V. Musale, M. P. Pai, S. R. Sainkar and S. T. Kshirsagar, / Mater. Lett., 39, 86 (1999). CrossRef
    20. M. Yoshiwaka, Y. Kaneko, C. F. Yang, H. Tokura and M. Kamo, / J. Japan. Soc. Precision Eng., 54, 1703 (1988). CrossRef
    21. A. Gicquel, F. Silva and K. Hassouni, / J. Electrochem. Soc., 147, 2218 (2000). CrossRef
    22. M. A. Dar, S. G. Ansari, H. K. Seo, G. S. Kim, Y. S. Kim, S. K. Kulkarni and H. S. Shin, / Carbon, 43, 855 (2005). CrossRef
    23. M. Katoh, H. Aoki and H. Kawarda, / Jpn. J. Appl. Phys., 33, L194 (1994). CrossRef
    24. Y. F. Zhang, F. Zhang, Q. J. Gao, X. F. Peng and Z. D. Lin, / Dia. Rel. Mater., 10, 1523 (2001). CrossRef
    25. V. Baranauskas, H. J. Ceragioli, A. C. Peterlevitz, M. C. Tosin and S. F. Durrant, / Thin Sol. Films, 377, 303 (2000). CrossRef
    26. S. C. Lawson, H. Kanda, K. Watanabe, I. Kiflawi, Y. Sato and A. T. Collins, / J. Appl. Phys., 79, 4348 (1996). CrossRef
    27. J. B. Donnet, D. Paulmier, H. Oulanti and T. L. Huu, / Carbon, 42, 2215 (2004). CrossRef
    28. S.G. Ansari, T. L. Anh, H. K. Seo, K.G. Sung, M. A. Dar and H. S. Shin, / J. Cryst. Growth, 265, 563 (2004). CrossRef
    29. M. A. Dar, S.G. Ansari, Y.-S. Kim, G.-S. Kim, H.-K. Seo, J. Shin, S. K. Kulkarni and H.-S. Shin, / Thin Sol. Films, 497, 103 (2006). CrossRef
    30. J. Robertson, / Mater. Sci. Eng. R, 37, 129 (2002). CrossRef
  • 作者单位:Mushtaq Ahmad Dar (1) (3)
    Hatem Abuhimd (2)
    Iftikhar Ahmad (1)
    Mohammad Islam (1)
    Mohammad Rezaul Karim (1)
    Hyung-Shik Shin (3)

    1. Center of Excellence for Research in Engineering Materials (CEREM), Advanced Manufacturing Institute, King Saud University, P. O. Box 800, Riyadh, 11421, Kingdom of Saudi Arabia
    3. School of Chemical Engineering, Chonbuk National University, Jeonju, 561-756, Korea
    2. National Nanotechnology Center, King Abdulaziz City for Science and Technology, Riyadh, 11442, Saudi Arabia
  • ISSN:1975-7220
文摘
An initial study on the nucleation and growth of diamond, using hot filament chemical vapor deposition (HFCVD) technique, was carried out on Co and CoO thin buffer layers on non-carbon substrates (Si (100)), and the results were compared with conventional scratching method. The substrate temperature during the growth was maintained at 750±50 °C. A mixture of CH4 and H2 (1: 100 volume %) was used for deposition. The total pressure during the two hour deposition was 30±2 Torr. X-ray photoelectron spectroscopy (XPS) study showed the diamond nucleation at different time periods on the Co and CoO seed layers. It is observed that Co helps in nucleation of diamond even though it is known to degrade the quality of diamond film on W-C substrate. The reason for improvement in our study is attributed to (i) the low content of Co (~0.01%) compared to W-C substrate (~5-%), (ii) formation of CoSi2 phase at elevated temperature, which might work as nucleation sites for diamond. SEM analysis reveals a change in the morphology of diamond film grown on cobalt oxide and a significant reduction in the size of densely packed crystallites. Raman spectroscopic analysis further suggests an improvement in the quality of the film grown on CoO buffer layer.
NGLC 2004-2010.National Geological Library of China All Rights Reserved.
Add:29 Xueyuan Rd,Haidian District,Beijing,PRC. Mail Add: 8324 mailbox 100083
For exchange or info please contact us via email.