搜索页_+A3.+Chemical+vapor+deposition+processes

设为首页

收藏本站

网站地图 | English | 公务邮箱

About the library

Background
History
Leadership
Organization

Readers' Guide

Opening Hours
Collections
Help Via Email

Publications

Electronic Information Resources

外文资源

Elsevier电子期刊(511)

在“Elsevier电子期刊”中，命中：511条，耗时：0.0699664 秒

在所有数据库中总计命中：515条

1.Synthesis of zirconia (ZrO₂) nanowires via chemical vapor deposition

作者：M.K. Baek ; S.J. Park ; D.J. Choi ; ^{drchoidj@yonsei.ac.kr}

关键词：A1. Nanostructures ; A1. Growth models ; A2. Single crystal growth ; A3. Chemical vapor deposition processes ; B1. Oxides

刊名：Journal of Crystal Growth

出版年：2017

2.Non-classical crystallization of silicon thin films during hot wire chemical vapor deposition

作者：Jae-Soo Jung^a ; Sang-Hoon Lee^b ; Da-Seul Kim^a ; Kun-Su Kim^a ; Soon-Won Park^a ; Nong-Moon Hwang^a ; ^c ; ^{nmhwang@snu.ac.kr}

关键词：A1. Crystal morphology ; A1. Growth model ; A2 Single crystal growth ; A3. Chemical vapor deposition processes ; B1. Nanomaterials ; B2. Semiconducting silicon

刊名：Journal of Crystal Growth

出版年：2017

3.Epitaxial growth of magnetic ZnCuO thin films by pulsed laser deposition

作者：Dong Hun Kim^a ; ^{dhkim@mju.ac.kr} ; Tae Cheol Kim^a ; Seung Han Lee^a ; Hyun Kyu Jung^a ; Jaeeun Jeong^a ; Seung Ho Han^b

关键词：A1. Crystal structure ; A3. Physical vapor deposition processes ; A3. Vapor phase epitaxy ; B2. Magnetic materials ; B2. Piezoelectric materials

刊名：Journal of Crystal Growth

出版年：2017

4.Growth of p-type ZnOS films by pulsed laser deposition

作者：Kenkichiro Kobayashi^a ; ^{tkkobay@ipc.shizuoka.ac.jp} ; Tohru Ohtsuki^a ; Yasumasa Tomita^a ; Yosiumi Kohno^a ; Yasuhisa Maeda^a ; Shigenori Matsushima^b

关键词：A1. Point defects ; A3. Physical vapor deposition processes ; B1. Oxides ; B2. Semiconducting II&ndash ; VI materials

刊名：Journal of Crystal Growth

出版年：2017

5.Formation of graphene/SiC/AlN multilayers synthesized by pulsed laser deposition on Si(110) substrates

作者：S. Narita ; K. Meguro ; T. Takami ; Y. Enta ; H. Nakazawa ; ^{hnaka@hirosaki-u.ac.jp}

关键词：A3. Physical vapor deposition processes ; B1. Nanomaterials ; B2. Semiconducting aluminum compounds ; B2. Semiconducting silicon compounds

刊名：Journal of Crystal Growth

出版年：2017

6.Hydride CVD Hetero-epitaxy of B₁₂P₂ on 4H-SiC

作者：C.D. Frye^a ; ^b ; C.K. Saw^a ; Balabalaji Padavala^b ; R.J. Nikolić^a ; J.H. Edgar^b ;

关键词：A3. Chemical vapor deposition processes ; A3. Hydride vapor phase epitaxy ; B1. Borides ; B2. Semiconducting boride compounds

刊名：Journal of Crystal Growth

出版年：2017

7.Epitaxial integration of tetragonal BiFeO₃ with silicon for nonvolatile memory applications

作者：Jingbin Zhu^a ; Zhigang Yin^a ; ^b ; ^{yzhg@semi.ac.cn} ; Zhen Fu^a ; Yajuan Zhao^a ; Xingwang Zhang^a ; ^b ; Xin Liu^a ; Jingbi You^a ; ^b ; Xingxing Li^a ; Junhua Meng^a ; Heng Liu^a ; Jinliang Wu^a

关键词：A1. Crystal structure ; A3. Physical vapor deposition processes ; A3. Heteroepitaxy ; B1. Oxide ; B2. Ferroelectric materials ; B3. Nonvolatile memory

刊名：Journal of Crystal Growth

出版年：2017

8.Growth and characterization of β-Ga₂O₃ nanowires obtained on not-catalyzed and Au/Pt catalyzed substrates

作者：Davide Calestani^a ; ^{calle@imem.cnr.it} ; Aderemi Babatunde Alabi^b ; Nicola Coppedè ; ^a ; Marco Villani^a ; Laura Lazzarini^a ; Filippo Fabbri^a ; ^c ; Giancarlo Salviati^a ; Andrea Zappettini^a

关键词：A1. Nanostructures ; A3. Chemical vapor deposition processes ; B1. Oxides ; B1. Nanomaterials ; B2. Semiconducting gallium compounds

刊名：Journal of Crystal Growth

出版年：2017

9.Lithium outdiffusion in LiTi₂O₄ thin films grown by pulsed laser deposition

作者：S. Mesoraca ; J.E. Kleibeuker ; B. Prasad ; J.L. MacManus-Driscoll ; M.G. Blamire

关键词：A3. Physical vapor deposition processes ; B1. Oxides ; B1. Lithium compounds ; B1. Titanium compounds ; B2. Oxide superconducting materials

刊名：Journal of Crystal Growth

出版年：2016

10.A simplified reaction model and numerical analysis for Si deposition from the SiHCl₃-H₂ system in vertical rotating disk reactors

作者：Soichiro Makino ; ^{makino@tytlabs.co.jp" class="auth_mail" title="E-mail the corresponding author} ; Masahide Inagaki ; Kenji Nakashima ; Takahiro Kozawa ; Nariaki Horinouchi

关键词：A1. Fluid flows ; A1. Growth models ; A1. Heat transfer ; A1. Mass transfer ; A3. Chemical vapor deposition processes ; B2. Semiconducting silicon

刊名：Journal of Crystal Growth

出版年：2016

按检索点细分(511)

关键词(473)

文摘(2)

按出版年细分(511)

2017年(8)

2016年(22)

2015年(5)

2013年(31)

2012年(20)

2011年(47)

2010年(31)

2009年(34)

2008年(47)

2007年(30)

2006年(27)

2005年(22)

2004年(39)

2003年(42)

2002年(57)

2001年(42)

2000年及以前(7)