设为首页
收藏本站
网站地图
|
English
|
公务邮箱
About the library
Background
History
Leadership
Organization
Readers' Guide
Opening Hours
Collections
Help Via Email
Publications
Electronic Information Resources
常用资源
电子图书
期刊论文
学位会议
外文资源
特色专题
内部出版物
Elsevier电子期刊(20)
ACS电子期刊(2)
在“
Elsevier电子期刊
”中,
命中:
20
条,耗时:小于0.01 秒
在所有数据库中总计命中:
22
条
1.
Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition
作者:
V?ino Sammelselg
;
Ivan Net?ipailo
;
Aleks
Aidla
;
Aivar Tarre
;
Lauri Aarik
;
Jelena Asari
;
Peeter Ritslaid
;
Jaan Aarik
关键词:
Metal oxide coatings
;
Atomic layer deposition
;
Wet chemical etching
;
X-ray fluorescence spectroscopy
刊名:Thin Solid Films
出版年:2013
2.
Atomic layer deposition of high capacitance density Ta
2
O
5
–ZrO
2
based dielectrics for metal–insulator–metal structures
作者:
Indrek Jõ
;
gi
;
Kaupo Kukli
;
Mikko Ritala
;
Markku Leskelä
;
Jaan Aarik
;
Aleks
Aidla
;
Jun Lu
关键词:
Nanolaminates
;
Atomic layer deposition
;
High-k dielectric
刊名:Microelectronic Engineering
出版年:2010
3.
Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene
作者:
Kaupo Kukli
;
Jaan Aarik
;
Aleks
Aidla
;
Teet Uustare
;
Indrek Jõ
;
gi
;
Jun Lu
;
Massimo Tallarida
;
Marianna Kemell
;
Alma-Asta Kiisler
;
Mikko Ritala
;
Markku Leskelä
关键词:
A1. Crystal morphology
;
A1. Substrates
;
A1. Roughening
;
A3. Chemical vapor deposition processes
;
A3. Atomic layer epitaxy
;
A3. Polycrystalline deposition
刊名:Journal of Crystal Growth
出版年:2010
4.
Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates
作者:
Indrek Jõ
;
gi
;
Martti Pä
;
rs
;
Jaan Aarik
;
Aleks
Aidla
;
Matti Laan
;
Jonas Sundqvist
;
Lars Oberbeck
;
Johannes Heitmann
;
Kaupo Kukli
关键词:
Nanostructures
;
Titanium oxide
;
Atomic layer deposition
;
Crystal structure
;
Chemical composition
刊名:Thin Solid Films
出版年:2008
5.
Influence of TiO
2
incorporation in HfO
2
and Al
2
O
3
based capacitor dielectrics
作者:
Kaupo Kukli
;
Mikko Ritala
;
Markku Leskelä
;
Jonas Sundqvist
;
Lars Oberbeck
;
Johannes Heitmann
;
Uwe Schrö
;
der
;
Jaan Aarik
;
Aleks
Aidla
关键词:
Atomic layer deposition
;
Dielectric properties
;
Multilayers
;
Nanostructures
刊名:Thin Solid Films
出版年:2007
6.
Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO
2
and ZrO
2
thin films
作者:
Jaan Aarik
;
Aleks
Aidla
;
Aarne Kasikov
;
Hugo Mä
;
ndar
;
Raul Rammula and Vä
;
ino Sammelselg
关键词:
Hafnium dioxide
;
Zirconium dioxide
;
Atomic layer deposition
;
Surface reactions
;
Crystal structure
;
Optical properties
刊名:Applied Surface Science
出版年:2006
7.
Precursor-dependent structural and electrical characteristics of atomic layer deposited films: Case study on titanium oxide
作者:
Indrek Jõ
;
gi
;
Kaupo Kukli
;
Jaan Aarik
;
Aleks
Aidla
;
Jun Lu
关键词:
Titanium dioxide
;
Atomic layer deposition
;
Dielectric properties
;
Metal-insulator-semiconductor structures
;
Metal-insulator-metal structures
刊名:Materials Science in Semiconductor Processing
出版年:2006
8.
Effects of precursors on nucleation in atomic layer deposition of HfO
2
作者:
Aarik
;
Jaan
;
Aidla
;
Aleks
;
Kikas
;
Arvo
;
Kä
;
ä
;
mbre
;
Tanel
;
Rammula
;
Raul
;
Ritslaid
;
Peeter
;
et. al.
关键词:
68.55
;
77.55
;
78.65
;
79.60
;
Hafnium dioxide
;
Atomic layer deposition
;
Nucleation
;
Surface structure
刊名:Applied Surface Science
出版年:2004
9.
Engineering structure and properties of hafnium oxide films by atomic layer deposition temperature
作者:
Kukli
;
Kaupo
;
Aarik
;
Jaan
;
Uustare
;
Teet
;
Lu
;
Jun
;
Ritala
;
Mikko
;
Aidla
;
Aleks
;
Pung
;
Lembit
;
H??rsta
;
Anders
;
et. al.
刊名:Thin Solid Films
出版年:2005
10.
Atomic layer growth of epitaxial TiO
2
thin films from TiCl
4
and H
2
O on α-Al
2
O
3
substrates
作者:
Aarik
;
Jaan
;
Aidla
;
Aleks
;
Mä
;
ndar
;
Hugo
;
Uustare
;
Teet
;
Schuisky
;
Mikael
;
Hå
;
rsta
;
Anders
关键词:
61.50.K
;
68.55
;
A1.Surface structure
;
A3.Atomic layer deposition
;
B1.Titanium dioxide
;
B2.Optical properties
刊名:Journal of Crystal Growth
出版年:2002
1
2
按检索点细分(20)
作者(20)
按出版年细分(20)
2013年(1)
2010年(2)
2008年(1)
2007年(1)
2006年(2)
2005年(1)
2004年(1)
2002年(4)
2001年(2)
2000年(4)
2000年及以前(1)
NGLC 2004-2010.National Geological Library of China All Rights Reserved.
Add:29 Xueyuan Rd,Haidian District,Beijing,PRC. Mail Add: 8324 mailbox 100083
For exchange or info please contact us via
email
.