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SpringerLink电子期刊(15)
NATURE电子期刊(2)
ACS电子期刊(30)
ProQuest学位论文(1)
Elsevier电子期刊(147)
在“
Elsevier电子期刊
”中,
命中:
147
条,耗时:小于0.01 秒
在所有数据库中总计命中:
195
条
1.
Gate
patterning
in 14 nm and beyond nodes: from planar devices to three dimensional Finfet devices
作者:
Lingkuan Meng
;
menglingkuan@ime.ac.cn" class="auth_mail" title="E-mail the corresponding author
;
Peizhen Hong
;
Xiaobin He
;
Chunlong Li
;
Junjie Li
;
Junfeng Li
;
Chao Zhao
;
Yayi Wei
;
Jiang Yan
关键词:
14
;
nm and beyond nodes
;
Finfet
;
Gate
patterning
;
SiO2/Si3N4/SiO2 mask
;
Sidewall redeposition
刊名:Applied Surface Science
出版年:2016
2.
Neural
patterning
of human induced pluripotent stem cells in 3-D cultures for studying biomolecule-directed differential cellular responses
作者:
Yuanwei Yan
a
;
Julie Bejoy
a
;
Junfei Xia
a
;
Jingjiao Guan
a
;
Yi Zhou
b
;
Yan Li
a
;
yli@eng.fsu.edu" class="auth_mail" title="E-mail the corresponding author
关键词:
Pluripotent stem cells
;
Neural
patterning
;
Neurotoxicity
;
Three-dimensional
;
Biomolecules
刊名:Acta Biomaterialia
出版年:2016
3.
Surface treatment process applicable to next generation graphene-based electronics
作者:
Ki Seok Kim
a
;
Hyo-Ki Hong
c
;
Hanearl Jung
d
;
Il-Kwon Oh
d
;
Zonghoon Lee
c
;
Hyungjun Kim
d
;
Geun Young Yeom
a
;
b
;
gyyeom@skku.edu" class="auth_mail" title="E-mail the corresponding author
;
Kyong Nam Kim
e
;
knam1004@skku.edu" class="auth_mail" title="E-mail the corresponding author
刊名:Carbon
出版年:2016
4.
Innovatively composite hard mask to feature sub-30 nm
gate
patterning
作者:
Lingkuan Meng
;
menglingkuan@ime.ac.cn" class="auth_mail
;
Chunlong Li
;
Xiaobin He
;
Jun Luo
;
Junfeng Li
;
Chao Zhao
;
Jiang Yan
关键词:
Hard mask
;
Plasma etching
;
Sub-30
;
nm
;
Etch selectivity
;
Line width roughness
;
Gate
patterning
刊名:Microelectronic Engineering
出版年:5 September 2014
5.
Torsion based universal MEMS logic device
作者:
Saad Ilyas
a
;
saad.ilyas@kaust.edu.sa" class="auth_mail" title="E-mail the corresponding author
;
saad.ilyas@gmail.com" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Arpys Arevalo
b
;
arpys.arevalo@kaust.edu.sa" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Ernesto Bayes
b
;
ernesto.byas@kaust.edu.sa" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Ian G. Foulds
b
;
c
;
ian.foulds@ubc.ca" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Mohammad I. Younis
a
;
mohammad.younis@kaust.edu.sa" class="auth_mail" title="E-mail the corresponding author
Author Vitae
关键词:
Logic device
;
Micromirror
;
Polyimide
刊名:Sensors and Actuators A: Physical
出版年:2015
6.
Fabrication of a planar water
gate
d organic field effect transistor using a hydrophilic polythiophene for improved digital inverter performance
作者:
B. Yaman
;
I. Terkesli
;
K.M. Turksoy
;
A. Sanyal
;
S. Mutlu
关键词:
Water
gate
d organic field effect transistor
;
Planar
gate
electrode
;
Polythiophene (P3HT) functionalized with poly(ethylene glycol)(PEG)
;
Hydrophilic semiconductor polymer
;
Transconductance of OFET
;
Gain of digital inverter
刊名:Organic Electronics
出版年:March, 2014
7.
Improvement of metal
gate
/high-k dielectric CMOSFETs characteristics by neutral beam etching of metal
gate
作者:
K.S. Min
a
;
d
;
e
;
C. Park
e
;
C.Y. Kang
e
;
C.S. Park
e
;
B.J. Park
f
;
Y.W. Kim
b
;
B.H. Lee
c
;
Jack C. Lee
d
;
G. Bersuker
e
;
P. Kirsch
e
;
R. Jammy
e
;
G.Y. Yeom
a
;
gyyeom@skku.edu
关键词:
Neutral beam etching
;
Metal
gate
;
Complementary metal&ndash
;
oxide&ndash
;
semiconductor field effect transistors (CMOSFETs)
刊名:Solid-State Electronics
出版年:2013
8.
All-optical logic
gate
s for 40 Gb/s NRZ signals using complementary data in SOA-MZIs
作者:
Gang Wang
;
Xuelin Yang
;
x.yang@sjtu.edu.cn
;
Weisheng Hu
关键词:
Semiconductor optical amplifier
;
Mach&ndash
;
Zehnder interferometer
;
All-optical logic
gate
s
;
NRZ format
刊名:Optics Communications
出版年:2013
9.
Characteristics of thin-film transistors based on silicon nitride passivation by excimer laser direct
patterning
作者:
Chao-Nan Chen
a
;
d9228101@gmail.com
;
Jung-Jie Huang
b
关键词:
Amorphous-silicon (a-Si)
;
Laser direct
patterning
;
Silicon nitride (SiNx)
;
Thin-film transistor (TFT)
刊名:Thin Solid Films
出版年:2013
10.
Sub-10 nm
patterning
by focused He-ion beam milling for fabrication of downscaled graphene nano devices
作者:
Nima Kalhor
;
Stuart A. Boden
;
Hiroshi Mizuta
关键词:
Helium ion microscope
;
Graphene
;
Nanofabrication
;
Lithography
;
Nanoelectronics
;
Helium ion beam milling
;
Graphene quantum dot devices
;
Graphene downscaled nano devices
刊名:Microelectronic Engineering
出版年:February, 2014
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