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SpringerLink电子期刊(5)
Elsevier电子期刊(11)
在“
Elsevier电子期刊
”中,
命中:
11
条,耗时:小于0.01 秒
在所有数据库中总计命中:
16
条
1.
Role of substrate outgassing on the formation dynamics of either hydrophilic or hydrophobic wood surfaces in atmospheric-pressure,
organosilicon
plasmas
作者:
O. Levasseur
;
L. Stafford
;
N. Gherardi
;
N. Naud¨¦
;
E. Beche
;
J. Esvan
;
P. Blanchet
;
B. Riedl
;
A. Sarkissian
关键词:
Atmospheric-pressure
plasmas
;
Dielectric barrier discharges
;
Functional coatings
;
Organosilicon
plasmas
;
Wood
刊名:Surface and Coatings Technology
出版年:2013
2.
Enhanced scratch resistance of flexible carbon fiber-reinforced polymer composites by low temperature plasma-polymerized
organosilicon
oxynitride: The effects of nitrogen addition
作者:
Y.-S. Lin
a
;
yslin@fcu.edu.tw
;
C.-H. Hu
a
;
C.-A. Hsiao
b
关键词:
A. Carbon fibers
;
A. Flexible composites
;
B. Surface treatment
;
D. Hardness testing
;
E. Plasma deposition
刊名:Composites Science and Technology
出版年:2011
3.
Silicon nitride and oxynitride films deposited from
organosilicon
plasmas
: ToF–SIMS characterization with multivariate analysis
作者:
Federica M. Piras
;
Rosa Di Mundo
;
Francesco Fracassi
;
Agnese Magnani
关键词:
Plasma enhanced chemical vapour deposition (PECVD)
;
Silicon nitride and oxynitride
;
Bis(dimethylamino)dimethylsilane
;
Surface chemistry
;
ToF–
;
SIMS
;
Multivariate analysis
刊名:Surface and Coatings Technology
出版年:2008
4.
Characterization of Si:O:C:H films fabricated using electron emission enhanced chemical vapour deposition
作者:
Steven F. Durrant
;
Francisco P.M. Rouxinol
;
Rogé
;
rio V. Gelamo
;
B. Clá
;
udio Trasferetti
;
C.U. Davanzo
;
Mario A. Bica de Moraes
关键词:
TEOS
;
Si
OC ;
H thin film
;
EEECVD
;
PECVD
;
FTIR
;
XPS
刊名:Thin Solid Films
出版年:2008
5.
Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency
plasmas
作者:
A. Bousquet
;
A. Granier
;
A. Goullet and J.P. Landesman
关键词:
PECVD
;
Pulsed plasma
;
Hexamethyldisiloxane
;
Silicon oxide
;
Optical properties
刊名:Thin Solid Films
出版年:2006
6.
Infrared absorption analysis of
organosilicon
/oxygen
plasmas
in a microwave multipolar plasma excited by distributed electron cyclotron resonance
作者:
Raynaud
;
P.
;
Amilis
;
T.
;
Segui
;
Y.
关键词:
Plasma
;
Organosilicon
;
Infrared spectroscopy
;
Thin-film deposition
;
52-70
;
IH
;
TI
;
PJP
;
CKD
;
SJ
刊名:Applied Surface Science
出版年:1999
7.
Electrochemical impedance spectroscopy evaluation of the corrosion behaviour of Mg alloy coated with PECVD
organosilicon
thin film
作者:
Angelini
;
E.
;
Grassini
;
S.
;
Rosalbino
;
F.
;
Fracassi
;
F.
;
d
;
Agostino
;
R.
关键词:
Electrochemical impedance spectroscopy
;
Magnesium alloys
;
Corrosion protection
;
PECVD
;
Thin film
刊名:Progress in Organic Coatings
出版年:2003
8.
A comparative study of oxygen/
organosilicon
plasmas
and thin SiO
x
C
y
H
z
films deposited in a helicon reactor
作者:
Aumaille
;
K.
;
Vallé
e ;
C.
;
Granier
;
A.
;
Goullet
;
A.
;
Gaboriau
;
F.
;
Turban
;
G.
关键词:
Organosilicon
films
;
Plasma processing and deposition
;
Silicon oxide
刊名:Thin Solid Films
出版年:2000
9.
Spectroscopic and electrochemical characterisation of thin cathodic plasma polymer films on iron
作者:
Barranco
;
V.
;
Thiemann
;
P.
;
Yasuda
;
H.K.
;
Stratmann
;
M.
;
Grundmeier
;
G.
关键词:
Plasma polymer
;
Kelvin probe
;
Electrochemical impedance spectroscopy
;
Water uptake
;
Thin films
刊名:Applied Surface Science
出版年:2004
10.
Infrared absorption analysis of
organosilicon
/oxygen
plasmas
in a microwave multipolar plasma excited by distributed electron cyclotron resonance
作者:
Raynaud
;
P.
;
Amilis
;
T.
;
Segui
;
Y.
关键词:
Plasma
;
Organosilicon
;
Infrared spectroscopy
;
Thin-film deposition
;
52-70
;
IH
;
TI
;
PJP
;
CKD
;
SJ
刊名:Applied Surface Science
出版年:1999
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