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内部出版物
Wiley电子期刊(1)
SpringerLink电子期刊(1)
Elsevier电子期刊(29)
ACS电子期刊(12)
在“
Elsevier电子期刊
”中,
命中:
29
条,耗时:0.0259858 秒
在所有数据库中总计命中:
43
条
1.
Phase analysis and thermal stability of thin films synthesized via solid state reaction of Ni with Si
1 − x
Ge
x
substrate
作者:
Antony Premkumar Peter
;
anthony.peter@imec.be" class="auth_mail" title="E-mail the corresponding author
;
Thomas Witters
;
Shibesh Dutta
;
Andriy Hikavvy
;
Inge Vaesen
;
Sven
Van
Elshocht
;
Marc Schaekers
关键词:
Ni
;
Si1
;
&minus
;
;
xGex
;
Nickel-silicide
;
Nickel-germanide
;
Resistivity
;
Surface morphology
;
Thermal stability
刊名:Microelectronic Engineering
出版年:2016
2.
Scalability of RuTiN barriers deposited by plasma-enhanced atomic layer deposition for ad
van
ced interconnects
作者:
Johan Swerts
;
Johan.Swerts@imec.be" class="auth_mail
;
Yong-Kong Siew
;
Els
Van
Besien
;
Yohan Barbarin
;
Karl Opsomer
;
Jü
;
rgen Bö
;
mmels
;
Zsolt T艖kei
;
Sven
Van
Elshocht
关键词:
Plasma enhanced atomic layer deposition
;
Ruthenium
;
Interconnects
;
Barrier
刊名:Microelectronic Engineering
出版年:25 May, 2014
3.
Low-k a-SiCO:H films as diffusion barriers for ad
van
ced interconnects
作者:
Els
Van
Besien
;
els.
van
besien@imec.be" class="auth_mail
;
Arjun Singh
;
Yohan Barbarin
;
Patrick Verdonck
;
Harold F.W. Dekkers
;
Kris
Van
streels
;
Jean-Franç
;
ois de Marneffe
;
Mikhail R. Baklanov
;
Sven
Van
Elshocht
关键词:
SiCO
;
Low-k
;
Copper barrier
;
TDDB
;
Moisture barrier
;
Copper interconnects
刊名:Microelectronic Engineering
出版年:25 May, 2014
4.
Low temperature chemical vapour synthesis of Cu
3
Ge thin films for interconnect applications
作者:
P. Antony Premkumar
;
anthony.peter@imec.be" class="auth_mail
;
L. Carbonell
;
M. Schaekers
;
K. Opsomer
;
C. Adelmann
;
O. Richard
;
H. Bender
;
A. Franquet
;
J. Meersschaut
;
L. Wen
;
T. Zsolt
;
S.
Van
Elshocht
关键词:
Metal germanides
;
Thin films
;
Chemical vapour synthesis
;
Physical properties
;
Thermal stability
;
Interconnect applications
刊名:Microelectronic Engineering
出版年:25 May, 2014
5.
Chemisorption of ALD precursors in and on porous low-k films
作者:
P. Verdonck
;
verdonck@imec.be
;
A. Delabie
;
J. Swerts
;
L. Farrell
;
M.R. Baklanov
;
H. Tielens
;
E.
Van
Besien
;
T. Witters
;
L. Nyns
;
S.
Van
Elshocht
关键词:
Low-k
;
Thin films
;
Atomic layer deposition
刊名:Microelectronic Engineering
出版年:2013
6.
Medium energy ion scattering for the high depth resolution characterisation of high-k dielectric layers of nanometer thickness
作者:
J.A.
van
den Berg
;
M.A. Reading
;
P. Bailey
;
T.Q.C. Noakes
;
C. Adelmann
;
M. Popovici
;
H. Tielens
;
T. Conard
;
S. de Gendt
;
S.
van
Elshocht
关键词:
Medium energy ion scattering analysis
;
High resolution depth profiling
;
High-k nanolayers
;
Metal&ndash
;
insulator&ndash
;
metal capacitor (MIMcap) layers
刊名:Applied Surface Science
出版年:2013
7.
Selective chemical vapor synthesis of Cu
3
Ge: Process optimization and film properties
作者:
Antony Premkumar Peter
;
anthony.peter@imec.be
;
Laureen Carbonell
;
Marc Schaekers
;
Christoph Adelmann
;
Johan Meersschaut
;
Alexis Franquet
;
Olivier Richard
;
Hugo Bender
;
Tokei Zsolt
;
Sven
van
Elshocht
关键词:
A. Intermetallics
;
miscellaneous
;
B. Phase identification
;
C. Reaction synthesis
;
C. Thin films
;
E. Physical properties
;
miscellaneous
刊名:Intermetallics
出版年:2013
8.
Infrared molar absorption coefficient of H
2
O stretching modes in SiO
2
作者:
H.F.W. Dekkers
;
A. Gallo
;
S.
Van
Elshocht
关键词:
Water
;
SiO2
;
Absorption coefficient
;
IR spectrum
;
Silanol
刊名:Thin Solid Films
出版年:2013
9.
Strontium niobate high-k dielectrics: Film deposition and material properties
作者:
A. Hardy
;
S.
Van
Elshocht
;
C. Adelmann
;
J.A. Kittl
;
S. De Gendt
;
M. Heyns
;
J. D’
;
Haen
;
M. D’
;
Olieslaeger
;
M.K.
Van
Bael
;
H.
Van
den Rul
;
J. Mullens
关键词:
Deposition
;
Sol–
;
gel
;
Oxides
;
Thin films
;
Dielectric constant
刊名:Acta Materialia
出版年:2010
10.
Study of interfacial reactions and phase stabilization of mixed Sc, Dy, Hf high-k
作者:
A. Hardy
;
C. Adelmann
;
S.
Van
Elshocht
;
H.
Van
den Rul
;
M.K.
Van
Bael
;
S. De Gendt
;
M. D’
;
Olieslaeger
;
M. Heyns
;
J.A. Kittl
;
J. Mullens
关键词:
ATR-FTIR
;
Hafnia
;
Scandate
;
Rare earth
;
High permittivity
刊名:Applied Surface Science
出版年:2009
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