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Elsevier电子期刊(123)
在“
Elsevier电子期刊
”中,
命中:
123
条,耗时:0.0749299 秒
在所有数据库中总计命中:
168
条
1.
In-situ X-ray μLaue diffraction study of copper
through
-
silicon
vias
作者:
Dario Ferreira Sanchez
a
;
b
;
Dario.Ferreira@psi.ch" class="auth_mail" title="E-mail the corresponding author
;
dario.f.sanchez@gmail.com" class="auth_mail" title="E-mail the corresponding author
;
Shay Reboh
a
;
b
;
Monica Larissa Djomeni Weleguela
a
;
b
;
Jean-Sé
;
bastien Micha
b
;
c
;
d
;
Odile Robach
b
;
c
;
d
;
Thierry Mourier
a
;
b
;
thierry.mourier@cea.fr" class="auth_mail" title="E-mail the corresponding author
;
Patrice Gergaud
a
;
b
;
Pierre Bleuet
a
;
b
关键词:
Through
silicon
vias
(TSVs)
;
Microelectronics reliability
;
Copper extrusion
;
Laue micro-diffraction
刊名:Microelectronics Reliability
出版年:2016
2.
A design methodology and various performance and fabrication metrics evaluation of 3D Network-on-Chip with multiplexed
Through
-
Silicon
Vias
作者:
Mostafa Said
;
a
;
mossaied2@gmail.com" class="auth_mail" title="E-mail the corresponding author
;
mostafa.saied@ejust.edu.eg" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Ahmed Shalaby
b
;
ahmed.shalaby@ejust.edu.eg" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Farhad Mehdipour
c
;
farhad@ejust.kyushu-u.ac.jp" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Morteza Biglari-Abhari
d
;
m.abhari@auckland.ac.nz" class="auth_mail" title="E-mail the corresponding author
Author Vitae
;
Mohamed El-Sayed
b
;
m.ragab@ejust.edu.eg" class="auth_mail" title="E-mail the corresponding author
Author Vitae
关键词:
3D Network-on-Chip
;
Traffic patterns
;
Through
-
Silicon
Vias
(TSVs)
;
Fabrication yield and cost
刊名:Microprocessors and Microsystems
出版年:2016
3.
Low-loss shielded
through
-
silicon
vias
filled with multi-walled carbon nanotube bundle
作者:
Jinrong Su
;
Runbo Ma
;
Xinwei Chen
;
Liping Han
;
Rongcao Yang
;
Wenmei Zhang
;
zhangwm@sxu.edu.cn
关键词:
Forward transmission coefficient
;
Multi-walled carbon nanotube (MWCNT)
;
Propagation constant
;
Through
-
silicon
via (TSV)
;
Time delay
刊名:Microelectronics Journal
出版年:2016
4.
Copper
Through
Silicon
Vias
Studied by Photo-elastic Scanning Infrared Microscopy
作者:
M. Herms
a
;
martin.herms@pvatepla.com" class="auth_mail" title="E-mail the corresponding author
;
M. Wagner
a
;
I. De Wolf
b
;
c
关键词:
copper
through
silicon
vias
;
scanning infrared stress explorer
;
SIREX
;
stress-induced birefringence
刊名:Microelectronics Reliability
出版年:2016
5.
The growth of carbon nanotubes on electrically conductive ZrN support layers for
through
-
silicon
vias
作者:
Sten Vollebregt
a
;
s.vollebregt@tudelft.nl" class="auth_mail" title="E-mail the corresponding author
;
Sourish Banerjee
a
;
1
;
Frans D. Tichelaar
b
;
Ryoichi Ishihara
a
关键词:
Carbon nanotubes
;
Chemical vapour deposition
;
Vertical interconnects
;
Through
silicon
vias
刊名:Microelectronic Engineering
出版年:2016
6.
Innovative polyimide liner deposition method for high-aspect-ratio and high-density
through
-
silicon
-
vias
(TSVs)
作者:
Yingtao Ding
;
Miao Xiong
;
Yangyang Yan
;
Shiwei Wang
;
Qianwen Chen
;
Weijing Wang
;
wangweijiang@bit.edu.cn" class="auth_mail" title="E-mail the corresponding author
;
Zhiming Chen
关键词:
Liner
;
Polyimide
;
Through
-
silicon
-
vias
(TSVs)
;
Step coverage
刊名:Microelectronic Engineering
出版年:2016
7.
Protrusion of electroplated copper filled in
through
silicon
vias
during annealing process
作者:
Si Chen
a
;
Fei Qin
a
;
qfei@bjut.edu.cn" class="auth_mail" title="E-mail the corresponding author
;
Tong An
a
;
antong@bjut.edu.cn" class="auth_mail" title="E-mail the corresponding author
;
Pei Chen
a
;
Bin Xie
b
;
Xunqing Shi
b
关键词:
Through
silicon
vias
;
Electroplated copper
;
Protrusion
;
Annealing
;
Grain size
刊名:Microelectronics Reliability
出版年:2016
8.
Measurement-based electrical characterization of
through
silicon
vias
and transmission lines for 3D integration
作者:
Xin Sun
a
;
Runiu Fang
a
;
Yunhui Zhu
a
;
Xiao Zhong
a
;
Yuan Bian
a
;
Yong Guan
a
;
Min Miao
b
;
Jing Chen
a
;
Yufeng Jin
c
;
a
;
yfjin@pku.edu.cn" class="auth_mail" title="E-mail the corresponding author
关键词:
3D integration
;
Through
silicon
via (TSV)
;
Transmission line
;
Electrical measurement
;
RF characterization
刊名:Microelectronic Engineering
出版年:2016
9.
Dielectric liner reliability in via-middle
through
silicon
vias
with 3 Micron diameter
作者:
Yunlong Li
a
;
yunlong.li@imec.be" class="auth_mail" title="E-mail the corresponding author
;
Stefaan Van Huylenbroeck
a
;
Philippe Roussel
a
;
Mohand Brouri
b
;
Sanjay Gopinath
c
;
Daniela M. Anjos
c
;
Matthew Thorum
c
;
Jengyi Yu
c
;
Gerald P. Beyer
a
;
Eric Beyne
a
;
Kristof Croes
a
关键词:
High aspect ratio
through
silicon
via
;
Sidewall roughness
;
Atom Layer Deposition
;
Dielectric reliability
;
Local field enhancement
;
Bimodal distribution
刊名:Microelectronic Engineering
出版年:2016
10.
Thermally-induced failures of copper
through
-
silicon
via structures evaluated by the strain energy density model
作者:
Chang-Fu Han
a
;
Jen-Fin Lin
a
;
b
;
jflin@mail.ncku.edu.tw" class="auth_mail" title="E-mail the corresponding author
关键词:
Through
-
silicon
vias
;
Current density
;
Strain energy density
刊名:Thin Solid Films
出版年:2016
1
2
3
4
5
6
7
8
9
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