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Wiley电子期刊(2)
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Elsevier电子期刊(54)
ACS电子期刊(4)
在“
Elsevier电子期刊
”中,
命中:
54
条,耗时:0.0389826 秒
在所有数据库中总计命中:
68
条
1.
Influence of the Discharge Mode on the Optical and Passivation Properties of SiN
x
:H Deposited by
PECVD
at
Atmospheric
Pressure
作者:
Ré
;
my Bazinette
a
;
b
;
remy.bazinette@promes.cnrs.fr" class="auth_mail" title="E-mail the corresponding author
;
Jean-Franç
;
ois Leliè
;
vre
a
;
Laura Gaudy
a
;
Franç
;
oise Massines
a
关键词:
silicon nitride
;
antireflective and passivation coating
;
atmospheric
pressure
discharges
;
dielectric barrier discharge (DBD)
刊名:Energy Procedia
出版年:2016
2.
Effects of dilution gas on characteristics of SiOC(H) films synthesized by
atmospheric
pressure
plasma CVD
作者:
Takanori Mori
;
tmori1050@gmail.com" class="auth_mail" title="E-mail the corresponding author
;
Taiki Masuko
;
Akira Shirakura
;
Tetsuya Suzuki
关键词:
SiOC(H)
;
PECVD
;
Hardness
;
Atmospheric
pressure
;
Thin film
刊名:Surface and Coatings Technology
出版年:2016
3.
Tetrakis(trimethylsilyloxy)silane for nanostructured SiO
2
-like films deposited by
PECVD
at
atmospheric
pressure
作者:
J. Schä
;
fer
a
;
jschaefer@inp-greifswald.de" class="auth_mail" title="E-mail the corresponding author
;
J. Hnilica
b
;
J. &Scaron
;
perka
b
;
c
;
A. Quade
a
;
V. Kudrle
b
;
R. Foest
a
;
J. Vodá
;
k
d
;
L. Zajίčková
;
b
;
c
关键词:
Tetrakis(trimethylsilyloxy)silane
;
Tetrakis(trimethylsiloxy)silane
;
Plasma jet
;
Silicon dioxide
刊名:Surface and Coatings Technology
出版年:2016
4.
Plasma-free Dry-chemical Texturing Process for High-efficiency Multicrystalline Silicon Solar Cells
作者:
Bishal Kafle
a
;
bishal.kafle@ise.fraunhofer.de" class="auth_mail" title="E-mail the corresponding author
;
Timo Freund
a
;
Abdul Mannan
a
;
Laurent Clochard
b
;
Edward Duffy
b
;
Sabrina Werner
a
;
Pierre Saint-Cast
a
;
Marc Hofmann
a
;
Jochen Rentsch
a
;
Ralf Preu
a
关键词:
black silicon
;
atmospheric
pressure
;
dry texturing
;
silicon nitride
;
surface passivation
;
emitter recombination
刊名:Energy Procedia
出版年:2016
5.
Achieving uniform layer deposition by
atmospheric
-
pressure
plasma-enhanced chemical vapor deposition
作者:
Jae-Ok Lee
a
;
Woo Seok Kang
a
;
b
;
kang@kimm.re.kr" class="auth_mail" title="E-mail the corresponding author
;
Min Hur
a
;
Jin Young Lee
a
;
Young-Hoon Song
a
;
b
关键词:
Plasma enhanced chemical vapor deposition (
PECVD
)
;
Atmospheric
-
pressure
plasma
;
Dielectric barrier discharge
;
TEMAZr
;
Zirconium dioxide
;
Precursors
刊名:Thin Solid Films
出版年:2015
6.
Atmospheric
pressure
PECVD
based on a linearly extended DC arc for adhesion promotion applications
作者:
Liliana Kotte
;
Holger Althues
;
Gerrit M?der
;
Julius Roch
;
Stefan Kaskel
;
Ines Dani
;
Tobias Mertens
;
Franz J. Gammel
关键词:
Atmospheric
pressure
PECVD
;
Atmospheric
pressure
plasma
;
Plasma surface treatment
;
Silicon dioxide films
;
Adhesion layers
刊名:Surface and Coatings Technology
出版年:2013
7.
Atmospheric
-
pressure
plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an
atmospheric
pressure
plasma jet
作者:
Yung-Sen Lin
;
yslin@fcu.edu.tw
;
Di-Jiun Lin
;
Ping-Ju Sung
;
Shih-Wei Tien
关键词:
Atmospheric
pressure
plasma
;
PECVD
;
Electrochromism
;
Nickel oxide
刊名:Thin Solid Films
出版年:2013
8.
Advances in
atmospheric
pressure
PECVD
: The influence of plasma parameters on film morphology
作者:
J.L. Hodgkinson
;
D.W. Sheel
关键词:
Titania
;
Pulse Plasma
;
Atmospheric
Pressure
;
CVD
;
Crystal Structure
刊名:Surface and Coatings Technology
出版年:2013
9.
Atmospheric
pressure
plasma enhanced chemical vapor deposition of hydrophobic coatings using fluorine-based liquid precursors
作者:
Jacqueline H. Yim
;
Victor Rodriguez-Santiago
;
Andr¨¦ A. Williams
;
Theodosia Gougousi
;
Daphne D. Pappas
;
James K. Hirvonen
关键词:
Plasma enhanced chemical vapor deposition (
PECVD
)
;
Hydrophobic coating
;
Dielectric barrier discharge (DBD)
;
Atmospheric
pressure
plasma jet (APPJ)
;
Organofluorosilane
;
Fluorocarbon
刊名:Surface and Coatings Technology
出版年:2013
10.
Hardness and surface roughness of hydrogenated amorphous carbon films synthesized by
atmospheric
pressure
plasma enhanced CVD method with various pulse frequencies
作者:
T. Sakurai
;
t-s-0127@z8.keio.jp
;
M. Noborisaka
;
T. Hirako
;
A. Shirakura
;
T. Suzuki
关键词:
Hydrogenated amorphous carbon
;
Atmospheric
pressure
;
CVD
;
Hardness
;
Surface roughness
刊名:Surface and Coatings Technology
出版年:2013
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