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在“
Elsevier电子期刊
”中,
命中:
4,309
条,耗时:0.0789618 秒
在所有数据库中总计命中:
6,737
条
1.
Low temperature
atomic
layer
deposition
of SiO
2
thin films using di-isopropylaminosilane and ozone
作者:
Young-Soo Lee
a
;
Dong-won Choi
a
;
Bonggeun Shong
b
;
Saeroonter Oh
c
;
sroonter@hanyang.ac.kr
;
Jin-Seong Park
a
;
jsparklime@hanyang.ac.kr
关键词:
Silicon dioxide
;
Atomic
layer
deposition
;
Low temperature
;
DIPAS
刊名:Ceramics International
出版年:2017
2.
Single-site zinc on silica catalysts for propylene hydrogenation and propane dehydrogenation: Synthesis and reactivity evaluation using an integrated
atomic
layer
deposition
-catalysis instrument
作者:
Jeffrey Camacho-Bunquin
a
;
Payoli Aich
a
;
b
;
Magali Ferrandon
a
;
Andrew &ldquo
;
Bean&rdquo
;
Getsoian
a
;
Ujjal Das
a
;
Fulya Dogan
a
;
Larry A. Curtiss
a
;
Jeffrey T. Miller
a
;
c
;
Christopher L. Marshall
a
;
Adam S. Hock
a
;
d
;
ahock@iit.edu
;
Peter C. Stair
a
;
e
关键词:
Hydrogenation
;
Dehydrogenation
;
Atomic
layer
deposition
;
Zinc
刊名:Journal of Catalysis
出版年:2017
3.
Atomic
layer
deposition
of Al
2
O
3
catalysts for narrow diameter distributed single-walled carbon nanotube arrays growth
作者:
Lei Tang
a
;
b
;
Qichong Zhang
a
;
Chaowei Li
a
;
b
;
Xiaona Wang
a
;
Kai Zhang
a
;
Yancui Xu
a
;
Taotao Li
a
;
Jianhui Fang
b
;
Yagang Yao
a
;
ygyao2013@sinano.ac.cn
关键词:
Atomic
layer
deposition
;
Al2O3 catalysts
;
Narrow diameter distributed
;
Single-walled carbon nanotube arrays
刊名:Carbon
出版年:2017
4.
Fabrication of hollow TiO
2
nanotubes through
atomic
layer
deposition
and MWCNT templates
作者:
H.A. Borbó
;
n-Nuñ
;
ez
a
;
b
;
hborbon@cnyn.unam.mx
;
D. Dominguez
b
;
c
;
F. Muñ
;
oz-Muñ
;
oz
d
;
J. Lopez
a
;
b
;
J. Romo-Herrera
b
;
G. Soto
b
;
H. Tiznado
b
关键词:
TiO2 nanotubes
;
Atomic
layer
deposition
;
Carbon nanotubes template
;
Removable template
刊名:Powder Technology
出版年:2017
5.
Interfacial engineering of two-dimensional nano-structured materials by
atomic
layer
deposition
作者:
Serge Zhuiykov
a
;
serge.zhuiykov@ugent.be" class="auth_mail" title="E-mail the corresponding author
;
Toshikazu Kawaguchi
b
;
c
;
Zhenyin Hai
a
;
Mohammad Karbalaei Akbari
a
;
Philippe M. Heynderickx
a
关键词:
Atomic
layer
deposition
(ALD)
;
Two-dimensional nano-materials
;
Nano-architecture
刊名:Applied Surface Science
出版年:2017
6.
Protecting an
atomic
layer
deposited aluminum oxide barrier coating on a flexible polymer substrate
作者:
Petri Johansson
a
;
petri.johansson@tut.fi
;
Hannu Teisala
a
;
Kimmo Lahtinen
b
;
Jurkka Kuusipalo
a
关键词:
Polyethylene
;
Atomic
layer
deposition
;
Aluminum oxide
;
Surface protecting
;
Web handling
;
Extrusion coating
刊名:Thin Solid Films
出版年:2017
7.
Nanotextured cupric oxide nanofibers coated with
atomic
layer
deposited ZnO-TiO
2
as highly efficient photocathodes
作者:
Min-woo Kim
a
;
b
;
1
;
Hyun Yoon
a
;
1
;
Tae Yoon Ohm
a
;
Hong Seok Jo
a
;
Seongpil An
a
;
Sung Kyu Choi
c
;
Hyunwoong Park
c
;
Salem S. Al-Deyab
d
;
Byoung Koun Min
b
;
e
;
Mark T. Swihart
f
;
Sam S. Yoon
a
;
skyoon@korea.ac.kr" class="auth_mail" title="E-mail the corresponding author
;
skyoonsoyoung@gmail.com" class="auth_mail" title="E-mail the corresponding author
关键词:
Cupric oxide nanofibers
;
Photocathode
;
Water splitting
;
Photocurrent density
;
Atomic
layer
deposition
刊名:Applied Catalysis B: Environmental
出版年:2017
8.
Atomic
layer
deposition
of VO
2
films with Tetrakis-dimethyl-amino vanadium (IV) as vanadium precursor
作者:
Xinrui Lv
a
;
b
;
Yunzhen Cao
a
;
yzhcao@mail.sic.ac.cn
;
Lu Yan
a
;
Ying Li
a
;
Lixin Song
a
关键词:
Atomic
layer
deposition
;
Vanadium precursor
;
Vanadium dioxide
;
Thin films
;
Metal-insulator transition
刊名:Applied Surface Science
出版年:2017
9.
Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature
atomic
layer
deposition
作者:
Thomas Henke
a
;
b
;
Thomas.Henke@tu-dresden.de
;
Martin Knaut
a
;
b
;
Christoph Hossbach
a
;
Marion Geidel
a
;
b
;
Matthias Albert
a
;
Johann W. Bartha
a
;
b
关键词:
Aluminum oxide (Al2O3)
;
Atomic
layer
deposition
(ALD)
;
Low-temperature
deposition
;
Flash lamp annealing (FLA)
;
Enhanced film density
;
Enhanced film growth
刊名:Surface and Coatings Technology
出版年:2017
10.
Stability enhancement of low temperature thin-film transistors with
atomic
-
layer
-deposited ZnO:Al channels
作者:
Wen-Jun Liu
;
You-Hang Wang
;
Li-Li Zheng
;
Hong-Liang Lu
;
Shi-Jin Ding
;
sjding@fudan.edu.cn
关键词:
ZnO
;
Al
;
Thin-film transistor
;
Atomic
layer
deposition
;
Stability
刊名:Microelectronic Engineering
出版年:2017
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