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内部出版物
在“
Elsevier电子期刊
”中,
命中:
19
条,耗时:小于0.01 秒
1.
The influence of substrate orientation on the density of silicon nanowires grown on multicrystalline and single crystal substrates by electron cyclotron resonance chemical vapour deposition
作者:
J. Ball
;
balljb@lsbu.ac.uk
;
H.S. Reehal
关键词:
Electron cyclotron resonance chemical vapour deposition
;
Silicon nanowires
;
Scanning electron microscopy
刊名:Thin Solid Films
出版年:2012
2.
Diamond-like carbon films deposited by a hybrid
ECRCVD
system
作者:
C.T. Guo
;
K.-H. Dittrich
关键词:
Diamond-like carbon (DLC)
;
Raman
;
ECRCVD
刊名:Applied Surface Science
出版年:2007
3.
A comparison of nitrous oxide and hydrogen ECR plasma discharges for silicon solar cell passivation
作者:
G.D.K. Mahanama
1
;
H.S. Reehal
;
;
;
reehalhs@lsbu.ac.uk
关键词:
Silicon solar cells
;
Passivation
;
Nitrous oxide
;
ECR plasma
刊名:Vacuum
出版年:2011
4.
Large-grained polycrystalline silicon films on glass by argon-assisted
ECRCVD
epitaxial thickening of seed layers
作者:
G. Ekanayake
;
T. Quinn
;
H.S. Reehal
;
B. Rau
;
S. Gall
关键词:
A1. Crystal structure
;
A3. ECR chemical vapour deposition
;
A3. Low temperature epitaxy
;
B2. Semiconducting silicon
刊名:Journal of Crystal Growth
出版年:2007
5.
Extended defects in Si films epitaxially grown by low-temperature
ECRCVD
作者:
B. Rau
;
K. Petter
;
I. Sieber
;
M. Stö
;
ger-Pollach
;
D. Eyidi
;
P. Schattschneider
;
S. Gall
;
K. Lips and W. Fuhs
关键词:
A1. Crystal structure
;
A1. Extended defects
;
A3. Low-temperature epitaxy
;
B2. Semiconducting silicon
刊名:Journal of Crystal Growth
出版年:2006
6.
Homo-epitaxial Si absorber layers grown by low-temperature
ECRCVD
作者:
Rau
;
B.
;
Sieber
;
I.
;
Selle
;
B.
;
Brehme
;
S.
;
Knipper
;
U.
;
Gall
;
S.
;
Fuhs
;
W.
关键词:
Silicon
;
Low-temperature epitaxy
;
ECRCVD
;
Electron backscattered diffraction
刊名:Thin Solid Films
出版年:2004
7.
Hydrogenated amorphous carbon nitride with controlled hydrogen density — Structural analysis and electric field emission property
作者:
Haruhiko Ito
;
Yukihisa Kogure
;
Noriko Ito
;
Satoshi Oki
;
Hidetoshi Saitoh
关键词:
Amorphous carbon nitride
;
ECRCVD
;
ZnO
;
Al whisker
;
Electric field emission
刊名:Surface and Coatings Technology
出版年:2008
8.
Structural evolution of SiN
x
films deposited by ECR and its light emission
作者:
Y. Xin
;
Z.X. Huang
;
Y. Shi
;
L. Pu
;
R. Zhang and Y.D. Zheng
关键词:
ECRCVD
;
SiN
x
;
FTIR
;
Light emission
刊名:Physica E
出版年:2005
9.
Large-grained polycrystalline silicon on glass for thin-film solar cells
作者:
S. Gall
;
J. Schneider
;
J. Klein
;
K. Hü
;
bener
;
M. Muske
;
B. Rau
;
E. Conrad
;
I. Sieber
;
K. Petter
;
K. Lips
et al.
关键词:
Aluminium
;
Chemical vapor deposition (CVD)
;
Crystallization
;
Epitaxy
刊名:Thin Solid Films
出版年:2006
10.
Development of a hybrid coating process for deposition of diamond-like carbon films on microdrills
作者:
H.Y. Ueng
;
C.T. Guo and K.-H. Dittrich
关键词:
DLC
;
ECR
;
Raman
;
Microdrill
刊名:Surface and Coatings Technology
出版年:2006
1
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