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在“Elsevier电子期刊”中，命中：83条，耗时：小于0.01 秒

1.Design and development of low activation energy based nonchemically amplified resists (n-CARs) for next generation EUV lithography

作者：Satinder K. Sharma^a ; ^{satinder@iitmandi.ac.in" class="auth_mail" title="E-mail the corresponding author} ; Satyendra Prakash Pal^a ; ^b ; Pulikanti Guruprasad Reddy^b ; Pawan Kumar^a ; Subrata Ghosh^b ; Kenneth E. Gonsalves^b ; ^{kenneth@iitmandi.ac.in" class="auth_mail" title="E-mail the corresponding author}

关键词：Extreme ultraviolet lithography (EUVL) ; Non-chemically amplified resists (n&ndash ; CARs) ; Low activation energy ; Next generation lithography (NGL)

刊名：Microelectronic Engineering

出版年：2016

2.Demonstrative setup of EUVL source from three plasmas to be coupled in capillary discharge

作者：X.Q. Zhang ; ^{zhangxinqiang.student@sina.com" class="auth_mail" title="E-mail the corresponding author} ; L. Jin

关键词：Plasma sources ; Z-pinches ; plasma focus ; and other pinch devices ; Hybrid methods ; Other topics in physics of plasmas and electric discharges

刊名：Optik - International Journal for Light and Electron Optics

出版年：2015

3.ULE^? Glass for EUVL applications, a fictive temperature correlation

作者：A.P. Carapella ; C.A. Duran ; K.E. Hrdina ; D.J. Sears ; J.E. Tingley ; ^{tingleyje@corning.com}

关键词：EUVL ; ULE® ; Glass ; Silica ; Titania ; Fictive temperature

刊名：Journal of Non-Crystalline Solids

出版年：2013

4.Ar⁺ ion beam machining of the carbon thin layer deposited on the Zerodur® substrate for EUVL projection optics

作者：K. Fujiwara ; ^a ; ^{pahlovy@hotmail.com"" rel=""nofollow} ; S.A. Pahlovy^a ; I. Miyamoto^a

关键词：EUVL optics ; Zerodur® ; substrate ; Carbon thin layer ; Surface roughness ; Ar⁺ ion beam

刊名：Microelectronic Engineering

出版年：2011

5.Electrostatic clamping with an EUVL mask chuck: Particle issues

作者：Gerhard Kalkowski^a ; ^{gerhard.kalkowski@iof.fraunhofer.de"" rel=""nofollow} ; Jacob R. Zeuske^b ; Stefan Risse^a ; Sandra Mü ; ller^a ; Thomas Peschel^a ; Mathias Rohde^a

关键词：Electrostatic chuck ; Pin chuck ; Particles ; EUVL ; Mask ; e-Beam

刊名：Microelectronic Engineering

出版年：2011

6.Electron irradiation-enhanced water and hydrocarbon adsorption in EUV lithography devices

作者：A. Al-Ajlony ; A. Kanjilal ; M. Catalfano ; S.S. Harilal ; A. Hassanein

关键词：EUV lithography ; Adsorption ; Au surface ; Secondary electrons ; Assisted adsorption

刊名：Applied Surface Science

出版年：15 January, 2014

7.Low energy Xe⁺ ion beam machining of ULE® substrates for EUVL projection optics – Evaluation of high-spatial frequency roughness

作者：Hironori Endo ; Takuro Inaba ; Shahjada A. Pahlovy ; Iwao Miyamoto

关键词：EUVL optics ; ULE® ; substrate ; Ion beam machining ; Surface roughness ; Xe⁺ ion beam

刊名：Microelectronic Engineering

出版年：2010

8.3-10 keV Xe⁺ ion beam machining of ultra low thermal expansion glasses for EUVL projection optics: Evaluation of surface roughness

作者：K. Morikawa ; ^{kishin298@gmail.com} ; K. Kamijo ; K. Morijiri ; S.A. Pahlovy ; N. Aikawa ; I. Miyamoto

刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

出版年：2012

9.Determination of local electrostatic forces for EUVL mask chucks

作者：Gerhard Kalkowski ; Thomas Peschel ; Stefan Risse ; S ; ra Mü ; ller ; Roxann L. Engelstad ; Jacob R. Zeuske ; Pradeep Vukkadala

关键词：Electrostatic chuck ; Lithography ; EUVL ; e-Beam

刊名：Microelectronic Engineering

出版年：2010

10.Kinetics of reduction of a RuO₂(1 1 0) film on Ru(0 0 0 1) by atomic hydrogen

作者：D. Ugur ; A.J. Storm ; R. Verberk ; J.C. Brouwer ; W.G. Sloof

关键词：Atomic hydrogen ; Mitigation ; RuO2 ; EUVL

刊名：Microelectronic Engineering

出版年：2013

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