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在“Elsevier电子期刊”中，命中：34条，耗时：小于0.01 秒

1.Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layers

作者：G. Greczynski^a ; ^{grzgr@ifm.liu.se} ; D. Primetzhofer^b ; J. Lu^a ; L. Hultman^a

关键词：TiN ; XPS ; Magnetron sputtering ; Binding energy ; VN ; CrN ; NbN ; ZrN ; MoN ; HfN ; TaN ; WN ; AlN ; SiN

刊名：Applied Surface Science

出版年：2017

2.Comparative study of macro- and microtribological properties of carbon nitride thin films deposited by HiPIMS

作者：Konstantinos D. Bakoglidis^a ; ^{konba@ifm.liu.se} ; ^{bakoglidis.konstantinos@gmail.com} ; Hervè ; Glenat^b ; Grzegorz Greczynski^a ; Susann Schmidt^a ; Stefano Grillo^b ; ^c ; Lars Hultman^a ; Esteban Broitman^a

关键词：Carbon-based coatings ; PVD coatings ; Carbon nitride ; Sliding wear ; Sliding friction ; Abrasion

刊名：Wear

出版年：2017

3.A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CN_x thin film growth with different inert gases

作者：Susann Schmidt^a ; ^{susann.schmidt@liu.se" class="auth_mail" title="E-mail the corresponding author} ; Zsolt Czigá ; ny^b ; Jonas Wissting^a ; Grzegorz Greczynski^a ; Erik Janzé ; n^c ; Jens Jensen^a ; Ivan Gueorguiev Ivanov^c ; Lars Hultman^a

关键词：Magnetron sputtering ; Inert gases ; Plasma analysis ; Langmuir probe measurement ; CNx film stress ; CNx hardness

刊名：Diamond & Related Materials

出版年：2016

4.Rolling contact fatigue of bearing components coated with carbon nitride thin films

作者：Konstantinos D. Bakoglidis^a ; ^{konba@ifm.liu.se" class="auth_mail" title="E-mail the corresponding author} ; ^{bakoglidis.konstantinos@gmail.com" class="auth_mail" title="E-mail the corresponding author} ; Ileana Nedelcu^b ; Susann Schmidt^a ; Grzegorz Greczynski^a ; ^{grzgr@ifm.liu.se" class="auth_mail" title="E-mail the corresponding author} ; Pascal Ehret^b ; Lars Hultman^a

关键词：Coating ; Pitting ; Rolling ; Lubrication

刊名：Tribology International

出版年：2016

5.Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputtering

作者：G. Greczynski ; ^{grzgr@ifm.liu.se" class="auth_mail" title="E-mail the corresponding author} ; L. Hultman

关键词：HIPIMS ; Growth rate ; Deposition rate ; Magnetron sputtering ; Ionized PVD

刊名：Vacuum

出版年：2016

6.Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivity

作者：G. Greczynski^a ; ^{grzgr@ifm.liu.se" class="auth_mail" title="E-mail the corresponding author} ; J. Lu^a ; O. Tengstrand^a ; I. Petrov^a ; ^b ; J.E. Greene^a ; ^b ; L. Hultman^a

关键词：CrN ; Thin films ; Toughness ; Resistivity ; Magnetron sputtering ; HIPIMS ; Transition-metal nitrides ; Ion mass spectrometry

刊名：Scripta Materialia

出版年：2016

7.Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films

作者：G. Greczynski^a ; ^b ; ^{grzgr@ifm.liu.se" class="auth_mail" title="E-mail the corresponding author}

关键词：XPS ; Surface chemistry ; Magnetron sputtering ; Carbon ; Titanium nitride

刊名：Applied Surface Science

出版年：2016

8.Improved adhesion of carbon nitride coatings on steel substrates using metal HiPIMS pretreatments

作者：Konstantinos D. Bakoglidis ; ^{konba@ifm.liu.se" class="auth_mail" title="E-mail the corresponding author} ; ^{bakoglidis.konstantinos@gmail.com" class="auth_mail" title="E-mail the corresponding author} ; Susann Schmidt ; Grzegorz Greczynski ; Lars Hultman

关键词：Adhesion ; Steel substrate ; Carbon nitride ; Coating ; HiPIMS ; Pretreatment

刊名：Surface and Coatings Technology

出版年：2016

9.Novel transparent MgSiON thin films with high hardness and refractive index

作者：Sharafat Ali^a ; ^{sharafat.ali@lnu.se" class="auth_mail" title="E-mail the corresponding author} ; Biplab Paul^b ; Roger Magnusson^b ; Grzegorz Greczynski^b ; Esteban Broitman^b ; Bo Jonson^a ; Per Eklund^b ; Jens Birch^b

关键词：Oxynitride thin films ; Magnetron sputtering ; High nitrogen content ; Hardness ; Refractive index

刊名：Vacuum

出版年：2016

10.Stoichiometric, epitaxial ZrB₂ thin films with low oxygen-content deposited by magnetron sputtering from a compound target: Effects of deposition temperature and sputtering power

关键词：A1. X-ray diffraction ; A1. X-ray photoelectron spectroscopy ; A3. Physical vapor deposition processes ; B1. Borides

刊名：Journal of Crystal Growth

出版年：2015

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2027年及以后(1)

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