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内部出版物
在“
Elsevier电子期刊
”中,
命中:
3
条,耗时:0.0139962 秒
1.
Hydrogen-argon plasma pre-treatment for improving the anti-corrosion properties of thin Al
2
O
3
films deposited using atomic layer deposition on steel
作者:
Emma Hä
;
rk&
ouml
;
nen
a
;
emma.harkonen@helsinki.fi
;
Stephen E. Potts
b
;
Wilhelmus M.M. Kessels
b
;
Belé
;
n Dí
;
az
c
;
d
;
Antoine Seyeux
c
;
d
;
Jolanta ?wiatowska
c
;
d
;
Vincent Maurice
c
;
d
;
Philippe Marcus
c
;
d
;
Gy&
ouml
;
rgy Radnó
;
czi
e
;
Lajos Tó
;
th
e
;
Maarit Kariniemi
a
;
Jaakko
Niinist
&
ouml
;
a
;
Mikko Ritala
a
关键词:
Atomic layer deposition
;
Plasma-enhanced atomic layer deposition
;
Corrosion
;
Coating
;
Plasma pre-treatment
;
Interface
刊名:Thin Solid Films
出版年:2013
2.
The effect of oxygen source on atomic layer deposited Al
2
O
3
as blocking oxide in metal/aluminum oxide/nitride/oxide/silicon memory capacitors
作者:
Nikolaos Nikolaou
a
;
b
;
n.nikolaou@imel.demokritos.gr
;
Vassilios Ioannou-Sougleridis
a
;
Panagiotis Dimitrakis
a
;
Pascal Normand
a
;
Dimitrios Skarlatos
b
;
Konstantinos Giannakopoulos
a
;
Kaupo Kukli
c
;
d
;
Jaakko
Niinist
&
ouml
;
c
;
Mikko Ritala
c
;
Markku Leskelä
;
c
关键词:
Charge trapping memories
;
High-k dielectrics
;
Aluminum oxide
;
MANOS
;
ALD
;
Oxygen source
刊名:Thin Solid Films
出版年:2013
3.
Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories
作者:
Nikolaos Nikolaou
a
;
Panagiotis Dimitrakis
a
;
Pascal Normand
a
;
Vassilios Ioannou-Sougleridis
a
;
v.ioannou@imel.demokritos.gr
;
Konstantinos Giannakopoulos
b
;
Konstantina Mergia
c
;
Kaupo Kukli
d
;
e
;
Jaakko
Niinist
&
ouml
;
d
;
Mikko Ritala
d
;
Markku Leskelä
;
d
关键词:
SONOS
;
Flash
;
Silicon nitride
;
Non-volatile memories
;
High-k dielectrics
;
Hafnium oxide
;
Zirconium oxide
刊名:Solid-State Electronics
出版年:2012
1
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2012年(1)
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