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CNKI学位论文(9)
在“
Elsevier电子期刊
”中,
命中:
33
条,耗时:小于0.01 秒
在所有数据库中总计命中:
9
条
1.
Atomic layer deposition of aluminum oxide on modified steel substrates
作者:
Kaupo
Kukli
a
;
b
;
kaupo
.
kukli
@ut.ee" class="auth_mail" title="E-mail the corresponding author
;
Emma Salmi
a
;
Taivo Jõ
;
giaas
b
;
Roberts Zabels
c
;
Mikael Schuisky
d
;
Jö
;
rgen Westlinder
d
;
Kenichiro Mizohata
e
;
Mikko Ritala
a
;
Markku Leskelä
;
a
关键词:
Atomic layer deposition
;
Nanoindentation
;
Steel
;
Aluminum oxide
;
Hardness
;
Insulators
刊名:Surface and Coatings Technology
出版年:2016
2.
Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes
作者:
Marko Part
;
Aile Tamm
;
Jekaterina Kozlova
;
Hugo M盲ndar
;
Tanel T盲tte
;
Kaupo
Kukli
关键词:
Atomic layer deposition
;
Sol&ndash
;
gel
;
MgO
;
Yttria stabilized zirconia (YSZ) microtubes
刊名:Thin Solid Films
出版年:28 February, 2014
3.
Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen
作者:
Kaupo
Kukli
a
;
b
;
kaupo
.
kukli
@ut.ee
;
kaupo
.
kukli
@helsinki.fi
;
Jaan Aarik
a
;
Aleks Aidla
a
;
Indrek Jõ
;
gi
a
;
Tõ
;
nis Arroval
a
;
Jun Lu
c
;
1
;
Timo Sajavaara
d
;
Mikko Laitinen
d
;
Alma-Asta Kiisler
a
;
Mikko Ritala
b
;
Markku Leskelä
;
b
;
John Peck
e
;
Jim Natwora
e
;
Joan Geary
e
;
Ronald Spohn
e
;
Scott Meiere
f
;
2
;
David M. Thompson
g
;
2
关键词:
Atomic layer deposition
;
Metal films
;
Ruthenium
刊名:Thin Solid Films
出版年:2012
4.
Atomic layer deposition of ferromagnetic cobalt doped titanium oxide thin films
作者:
Viljami Pore
a
;
1
;
Mukesh Dimri
b
;
Himani Khanduri
b
;
c
;
Raivo Stern
b
;
Jun Lu
d
;
Lars Hultman
d
;
Kaupo
Kukli
a
;
e
;
kaupo
.
kukli
@ut.ee
;
kaupo
.
kukli
@helsinki.fi
;
Mikko Ritala
a
;
Markku Leskelä
;
a
关键词:
Atomic layer deposition
;
Magnetization moments and magnetic susceptibilities
;
Magnetic properties of monolayers and thin films
刊名:Thin Solid Films
出版年:2011
5.
Growth and phase stabilization of HfO
2
thin films by ALD using novel precursors
作者:
Jaakko Niinistö
;
Miia Mä
;
ntymä
;
ki
;
Kaupo
Kukli
;
Leila Costelle
;
Esa Puukilainen
;
Mikko Ritala
;
Markku Leskelä
关键词:
A3. Atomic layer deposition
;
A3. Chemical vapor deposition processes
;
B2. Dielectric materials
;
B1. Oxides
刊名:Journal of Crystal Growth
出版年:2010
6.
Structure and morphology of Ru films grown by atomic layer deposition from 1-ethyl-1’-methyl-ruthenocene
作者:
Kaupo
Kukli
;
Jaan Aarik
;
Aleks Aidla
;
Teet Uustare
;
Indrek Jõ
;
gi
;
Jun Lu
;
Massimo Tallarida
;
Marianna Kemell
;
Alma-Asta Kiisler
;
Mikko Ritala
;
Markku Leskelä
关键词:
A1. Crystal morphology
;
A1. Substrates
;
A1. Roughening
;
A3. Chemical vapor deposition processes
;
A3. Atomic layer epitaxy
;
A3. Polycrystalline deposition
刊名:Journal of Crystal Growth
出版年:2010
7.
Atomic layer deposition and characterization of zirconium oxide–erbium oxide nanolaminates
作者:
Aile Tamm
;
Mikko Heikkilä
;
Marianna Kemell
;
Jekaterina Kozlova
;
Kaupo
Kukli
;
Vä
;
ino Sammelselg
;
Mikko Ritala
;
Markku Leskelä
关键词:
Atomic layer deposition
;
X-ray scattering
;
Diffraction and reflection
;
Crystallization
;
Electrical transport (conductivity
;
resistivity
;
mobility
;
etc.)
;
Rare earth metals
;
Oxides
;
Thin film structures
;
Insulating films
刊名:Thin Solid Films
出版年:2010
8.
Atomic layer deposition of high capacitance density Ta
2
O
5
–ZrO
2
based dielectrics for metal–insulator–metal structures
作者:
Indrek Jõ
;
gi
;
Kaupo
Kukli
;
Mikko Ritala
;
Markku Leskelä
;
Jaan Aarik
;
Aleks Aidla
;
Jun Lu
关键词:
Nanolaminates
;
Atomic layer deposition
;
High-k dielectric
刊名:Microelectronic Engineering
出版年:2010
9.
Comparison between the electrical properties of atomic layer deposited thin ZrO
2
films processed from cyclopentadienyl precursors
作者:
Salvador Dueñ
;
as
;
Helena Castá
n ;
Hé
;
ctor Garcí
a ;
Alfonso Gó
;
mez
;
Luis Bailó
n ;
Kaupo
Kukli
;
Jaakko Niinistö
;
Mikko Ritala
;
Markku Leskelä
关键词:
High permittivity dielectrics
;
Atomic layer deposition
;
Electrical characterization
刊名:Microelectronic Engineering
出版年:2009
10.
Conformity and structure of titanium oxide films grown by atomic layer deposition on silicon substrates
作者:
Indrek Jõ
;
gi
;
Martti Pä
;
rs
;
Jaan Aarik
;
Aleks Aidla
;
Matti Laan
;
Jonas Sundqvist
;
Lars Oberbeck
;
Johannes Heitmann
;
Kaupo
Kukli
关键词:
Nanostructures
;
Titanium oxide
;
Atomic layer deposition
;
Crystal structure
;
Chemical composition
刊名:Thin Solid Films
出版年:2008
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