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常用资源
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内部出版物
CNKI学位论文(15)
知网期刊论文(4)
在“
Elsevier电子期刊
”中,
命中:
5
条,耗时:小于0.01 秒
在所有数据库中总计命中:
19
条
1.
HLA-A, -B, and -DRB1 haplotype frequencies in 5-6/6 HLA matched parents
作者:
Nami Ikeda
;
Koji Hayashi
;
Takaomi Futagami
;
Hiroto Kojima
;
Takafumi Tsujino
;
Yasushi
Kusunoki
;
Naoki
Fujii
;
Shinji Suegami
;
Yuki Miyazaki
;
Yuto Horie
;
Mineko Nishikawa
;
Hidenori Tanaka
;
Hiroh Saji
刊名:Human Immunology
出版年:2015
2.
Su1656 Fecal Calprotectin Concentration Correlated With Both Endoscopic Severity and Disease Extent in Ulcerative Colitis: Analysis of Sum of Mayo Endoscopic Subscore for Five Colon Segments
作者:
Kousaku Kawashima
1
;
Shunji Ishihara
1
;
Takafumi Yuki
2
;
Hiroki Sonoyama
1
;
Yasumasa Tada
1
;
Akihiko Oka
1
;
Ryusaku
Kusunoki
1
;
Nobuhiko Fukuba
1
;
Naoki
Oshima
1
;
Ichiro Moriyama
1
;
Yoshikazu Kinoshita
1
刊名:Gastrointestinal Endoscopy
出版年:2015
3.
A study on aggressive proximity of embedded SiGe with comprehensive source drain extension engineering for 32 nm node high-performance pMOSFET technology
作者:
Hiroki Okamoto
;
Nobuaki Yasutake
;
Naoki
Kusunoki
;
Kanna Adachi
;
Hiroshi Itokawa
;
Kiyotaka Miyano
;
Tatsuya Ishida
;
Akira Hokazono
;
Shigeru Kawanaka
;
Ichiro Mizushima
;
Atsushi Azuma
;
Yoshiaki Toyoshima
关键词:
MOSFET
;
Stress
;
Mobility
;
Parasitic resistance
;
SiGe
;
Strained-Si
;
32-nm node
刊名:Solid-State Electronics
出版年:2009
4.
Source/drain engineering for MOSFETs with embedded-Si:C technology
作者:
Hiroshi Itokawa
;
Nobuaki Yasutake
;
Naoki
Kusunoki
;
Shintaro Okamoto
;
Nobutoshi Aoki
;
Ichiro Mizushima
关键词:
MOSFET
;
Strain
;
Silicon
;
Carbon
刊名:Applied Surface Science
出版年:2008
5.
A high performance pMOSFET with two-step recessed SiGe-S/D structure for 32 nm node and beyond
作者:
Nobuaki Yasutake
;
Atsushi Azuma
;
Tatsuya Ishida
;
Kazuya Ohuchi
;
Nobutoshi Aoki
;
Naoki
Kusunoki
;
Shinji Mori
;
Ichiro Mizushima
;
Tetsu Morooka
;
Shigeru Kawanaka
;
Yoshiaki Toyoshima
关键词:
SiGe-S/D
;
Strain
;
Mobility
;
MOSFET
刊名:Solid-State Electronics
出版年:2007
1
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