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CNKI期刊论文0611(47)
在“
Elsevier电子期刊
”中,
命中:
14,267
条,耗时:0.0699657 秒
在所有数据库中总计命中:
27,211
条
1.
Atmospheric-pressure
plasma
-enhanced chemical vapor
deposition
of microporous silica membranes for gas separation
作者:
Hiroki Nagasawa
;
Yuta Yamamoto
;
Nobukazu Tsuda
;
Masakoto Kanezashi
;
Tomohisa Yoshioka
;
Toshinori Tsuru
;
tsuru@hiroshima-u.ac.jp
关键词:
Atmospheric-pressure
plasma
;
Plasma
-enhanced chemical vapor
deposition
;
Microporous silica membrane
;
Gas separation
刊名:Journal of Membrane Science
出版年:2017
2.
Self-enhanced
plasma
discharge effect in the
deposition
of diamond-like carbon films on the inner surface of slender tube
作者:
Yi Xu
a
;
Liuhe Li
a
;
liliuhe@buaa.edu.cn" class="auth_mail" title="E-mail the corresponding author
;
Sida Luo
a
;
b
;
Qiuyuan Lu
c
;
Jiabin Gu
a
;
Ning Lei
a
;
Chunqin Huo
d
关键词:
Enhanced glow discharge
plasma
immersion ion implantation and
deposition
(EGD-PIII&D)
;
Diamond-like carbon (DLC)
;
Inner surface
;
Self-enhanced
plasma
discharge
刊名:Applied Surface Science
出版年:2017
3.
Characteristics of SiOx-containing hard film prepared by low temperature
plasma
enhanced chemical vapor
deposition
using hexamethyldisilazane or vinyltrimethylsilane and post oxygen
plasma
treatment
作者:
Yi-Syuan Wei
a
;
Wan-Yu Liu
a
;
Hsin-Ming Wu
a
;
Ko-Shao Chen
a
;
kschen@ttu.edu.tw
;
Vladimir Cech
b
关键词:
HMDSZ
;
VTMS
;
Plasma
deposition
;
Refractive index
;
Transmittance
刊名:Materials Chemistry and Physics
出版年:2017
4.
Low temperature growth of graphene using inductively-coupled
plasma
chemical vapor
deposition
作者:
Sami Pekdemir
;
M. Serdar Onses
;
onses@erciyes.edu.tr
;
Mehmet Hancer
关键词:
Graphene
;
Inductively-coupled
plasma
;
Chemical vapor
deposition
刊名:Surface and Coatings Technology
出版年:2017
5.
Fabrication of Ag nanoparticle/ZnO thin films using dual-
plasma
-enhanced metal-organic chemical vapor
deposition
(DPEMOCVD) system incorporated with photoreduction method and its application
作者:
Po-Hsun Lei
;
Chun-Han Cheng
关键词:
Ag NP/zinc oxide
;
Dual-
plasma
-enhanced metal-organic chemical vapor
deposition
;
Photoreduction
;
InGaN/GaN light-emitting diodes (LED)
刊名:Materials Science in Semiconductor Processing
出版年:2017
6.
Enhancement of Ga-doped zinc oxide film properties and
deposition
rate by multiple
deposition
using atmosphere pressure
plasma
jet
作者:
Yu-Yi Chen
;
Jia-Yang Juang
;
jiayang@ntu.edu.tw
关键词:
Transparent conductive oxide (TCO)
;
Gallium-doped zinc oxide (GZO)
;
Atmospheric pressure
plasma
jet (APPJ)
;
Thin films
刊名:Journal of Alloys and Compounds
出版年:2017
7.
Growth mechanism of Co thin films formed by
plasma
-enhanced atomic layer
deposition
using NH
3
as
plasma
reactant
作者:
Il-Kwon Oh
a
;
Hyungjun Kim
a
;
hyungjun@yonsei.ac.kr
;
Han-Bo-Ram Lee
b
;
hbrlee@inu.ac.kr
关键词:
Co PE-ALD
;
Residual gas analysis
;
Reaction mechanism
;
Cobaltocene
;
NH3
plasma
刊名:Current Applied Physics
出版年:2017
8.
Reactive
plasma
deposition
of high quality single phase CuO thin films suitable for metal oxide solar cells
作者:
Zhenzhen Li
a
;
b
;
Kemeng Tong
a
;
b
;
Ruifang Shi
c
;
Yonglong Shen
a
;
b
;
Yiqiang Zhang
a
;
b
;
Zhiqiang Yao
a
;
b
;
Jiajie Fan
a
;
b
;
fanjiajie@zzu.edu.cn
;
Mike Thwaites
a
;
b
;
Guosheng Shao
a
;
b
;
d
;
gsshao@zzu.edu.cn
关键词:
CuO thin films
;
Room temperature sputtering
deposition
;
Remote
plasma
sputtering
;
Optoelectronic properties
;
Tuning of hole concentration
刊名:Journal of Alloys and Compounds
出版年:2017
9.
The influence of methane flow rate on microstructure and surface morphology of a-SiC:H thin films prepared by
plasma
enhanced chemical vapor
deposition
technique
作者:
Lihua Jiang
a
;
jlihua107@163.com
;
Xinyu Tan
a
;
b
;
husttanxin@mail.tsinghua.edu.cn
;
Ting Xiao
a
;
b
;
Peng Xiang
a
关键词:
Hydrogenated amorphous silicon carbide
;
Thin films
;
Plasma
-enhanced chemical vapor
deposition
;
sp3 hybridized carbon
;
Surface morphology
刊名:Thin Solid Films
出版年:2017
10.
Controlling coffee ring structure on hydrophobic polymer surface by manipulating wettability with O
2
plasma
作者:
Li-Ying Cui
a
;
b
;
Yu Yan
b
;
Xin-Yu Zhao
a
;
Cun-Long Yu
a
;
Ying Ma
c
;
Bai Yang
b
;
byangchem@jlu.edu.cn
关键词:
Coffee ring
;
SiO2 microspheres
deposition
;
Drop evaporation
;
O2
plasma
;
PS surface
刊名:Chinese Chemical Letters
出版年:2017
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