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在“Elsevier电子期刊”中，命中：628条，耗时：0.0889577 秒

在所有数据库中总计命中：3,522条

1.Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH₃ as plasma reactant

作者：Il-Kwon Oh^a ; Hyungjun Kim^a ; ^{hyungjun@yonsei.ac.kr} ; Han-Bo-Ram Lee^b ; ^{hbrlee@inu.ac.kr}

关键词：Co PE-ALD ; Residual gas analysis ; Reaction mechanism ; Cobaltocene ; NH3 plasma

刊名：Current Applied Physics

出版年：2017

2.Facile one-pot synthesis of iron nanoparticles immobilized into the porous hydrochar for catalytic decomposition of phenol

作者：Chao Gai^a ; ^b ; Fang Zhang^c ; Qianqian Lang^a ; ^b ; Tingting Liu^a ; ^b ; Nana Peng^a ; ^b ; Zhengang Liu^a ; ^b ; ^{zgliu@rcees.ac.cn}

关键词：HTC ; hydrothermal carbonization ; NPs ; nanoparticles ; OMCVD ; organometallic chemical vapor deposition ; GC ; gas chromatograph ; TCD ; thermal conductivity detector ; ICP-AES ; inductively coupled plasma atomic emission spectrometry ; FE-SEM ; field-emission scanning electron microscope ; HR-TEM ; high-resolution transmission electron microscopy ; XRD ; X-rays diffraction ; BET ; Brunauer-Emmet-Teller ; SBET ; BET surface area ; Vpore ; total pore volume ; TPR ; emperature programmed reduction

刊名：Applied Catalysis B: Environmental

出版年：2017

3.The effect of thermal annealing on Fe/TiO₂ coatings deposited with the help of RF PECVD method. Part II. Optical and photocatalytic properties

作者：Anna Sobczyk-Guzenda ; ^{anna.sobczyk-guzenda@p.lodz.pl} ; Sławomir Owczarek ; Łukasz Kołodziejczyk ; Witold Jakubowski ; Maciej Gazicki-Lipman ; Hieronim Szymanowski

关键词：Fe/TiO2 coatings ; RF PECVD ; Thermal annealing ; Photowettability ; Photocatalysis

刊名：Ceramics International

出版年：2017

4.Plasma nitridation of atomic layer deposition (ALD) Al₂O₃ by NH₃ in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell

作者：Young Joon Cho ; Hamchorom Cha ; Hyo Sik Chang ; ^{hschang@cnu.ac.kr" class="auth_mail" title="E-mail the corresponding author}

关键词：Si solar cell ; Surface passivation ; Atomic layer deposition ; Plasma nitridation ; Al2O3 ; Carrier lifetime ; Plasma-enhanced chemical vapor deposition

刊名：Surface and Coatings Technology

出版年：2016

5.Plasma-enhanced atomic layer deposition of BaTiO₃

作者：Peter Schindler^a ; ¹ ; Yongmin Kim^a ; ¹ ; Dickson Thian^b ; Jihwan An^a ; ^c ; ^{jihwanan@seoultech.ac.kr" class="auth_mail" title="E-mail the corresponding author} ; Fritz B. Prinz^a ; ^d

关键词：High-k thin films ; Atomic layer deposition (ALD) ; Plasma-enhanced ALD ; DRAM capacitor

刊名：Scripta Materialia

出版年：2016

6.Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex

作者：Jeong Hwan Han^a ; ¹ ; ^{jhan@krict.re.kr" class="auth_mail" title="E-mail the corresponding author} ; Hyo Yeon Kim^a ; ^b ; ¹ ; Sang Chan Lee^a ; Da Hye Kim^a ; Bo Keun Park^a ; Jin-Seong Park^b ; Dong Ju Jeon^a ; Taek-Mo Chung^a ; Chang Gyoun Kim^a ; ^{cgkim@krict.re.kr" class="auth_mail" title="E-mail the corresponding author}

关键词：Tantalum nitride ; Plasma-enhanced atomic layer deposition ; Metal-organic precursor ; Copper diffusion barrier

刊名：Applied Surface Science

出版年：2016

7.Plasma-enhanced atomic layer deposition of zinc phosphate

作者：T. Dobbelaere^a ; ^{thomas.dobbelaere@ugent.be" class="auth_mail" title="E-mail the corresponding author} ; M. Minjauw^a ; T. Ahmad^a ; P.M. Vereecken^b ; C. Detavernier^a ; ^{christophe.detavernier@ugent.be" class="auth_mail" title="E-mail the corresponding author}

关键词：Atomic layer deposition ; Plasma-enhanced ; Phosphates ; Zinc phosphate

刊名：Journal of Non-Crystalline Solids

出版年：2016

8.Plasma-enhanced atomic layer deposition of SnO₂ thin films using SnCl₄ and O₂ plasma

作者：Dong-Kwon Lee^a ; Zhixin Wan^b ; Jong-Seong Bae^c ; Han-Bo-Ram Lee^d ; Ji-Hoon Ahn^e ; Sang-Deok Kim^f ; Jayong Kim^f ; ^{jayong.kim@sk.com" class="auth_mail" title="E-mail the corresponding author} ; Se-Hun Kwon^a ; ^b ; ^{sehun@pusan.ac.kr" class="auth_mail" title="E-mail the corresponding author}

关键词：Plasma-enhanced atomic layer deposition ; SnO2 thin films ; SnCl4 precursor ; O2 plasma

刊名：Materials Letters

出版年：2016

9.Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation

作者：Yongmin Kim^a ; Peter Schindler^a ; Anup L. Dadlani^b ; Shinjita Acharya^a ; J. Provine^a ; Jihwan An^a ; ^c ; ^{jihwanan@seoultech.ac.kr" class="auth_mail" title="E-mail the corresponding author} ; Fritz B. Prinz^a ; ^d

关键词：High-k thin films ; Doped barium titanate ; Plasma-enhanced ALD ; DRAM capacitor

刊名：Acta Materialia

出版年：2016

10.Working gas effect on properties of Al₂O₃ film in plasma-enhanced atomic layer deposition

作者：M. Hur^a ; ^{minhur@kimm.re.kr} ; J.Y. Lee^a ; W.S. Kang^a ; J.O. Lee^a ; Y.-H. Song^a ; S.J. Kim^b ; I.D. Kim^b

关键词：Al2O3 film ; Working gas effect ; Optical emission spectroscopy ; Plasma-enhanced atomic layer deposition ; SiOx interlayer

刊名：Thin Solid Films

出版年：2016

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