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CNKI学位论文(314)
知网期刊论文(90)
在“
Elsevier电子期刊
”中,
命中:
32
条,耗时:0.0319827 秒
在所有数据库中总计命中:
404
条
1.
Linking E
UV
lithography
line edge roughness and 16 nm NAND memory performance
作者:
Aless
;
ro Vaglio Pret
;
Pavel Poliakov
;
Roel Gronheid
;
Pieter Blomme
;
Miguel Mir
;
a Corbalan
;
Wim Dehaene
;
Diederik Verkest
;
Jan Van Houdt
;
Davide Bianchi
关键词:
Extreme
UV
lithography
;
Power spectral density
;
Line edge/width roughness
;
Error correcting code
;
Bit error rate
刊名:Microelectronic Engineering
出版年:2012
2.
Mask roughness impact on
extreme
UV
and 193 nm immersion
lithography
作者:
Konstantinos Garidis
;
Aless
;
ro Vaglio Pret
;
Roel Gronheid
关键词:
E
UV
;
LER
;
LWR
;
Frequency analysis
;
Programmed roughness
刊名:Microelectronic Engineering
出版年:2012
3.
Extreme
UV
diffraction grating fabricated by nanoimprint
lithography
作者:
Chun-Hung Lin
;
Yi-Ming Lin
;
Chia-Ching Liang
;
Yin-Yu Lee
;
Hok-Sum Fung
;
Bor-Yuan Shew
;
Szu-Hung Chen
关键词:
E
UV
interference
lithography
;
Diffraction grating
;
Nanoimprint
刊名:Microelectronic Engineering
出版年:2012
4.
2D and 3D photoresist line roughness characterization
作者:
Aless
;
ro Vaglio Pret
;
Eddy Kunnen
;
Roel Gronheid
;
Erwine Pargon
;
Olivier Luere
;
Davide Bianchi
关键词:
Lithography
;
LER
;
LWR
;
CD-SEM
;
CD-AFM
刊名:Microelectronic Engineering
出版年:2013
5.
Development of a large area plate-to-plate type
UV
imprinting tool
作者:
Wonho Choi
a
;
Inkoo Kang
a
;
Hong Jae Yim
b
;
Si-Hyung Lim
c
;
shlim@kookmin.ac.kr"" rel=""nofollow
关键词:
UV
imprint
lithography
;
Uniform pressurizing device
;
Pattern fidelity
;
Residual layer uniformity
;
Large area
刊名:Microelectronic Engineering
出版年:2011
6.
Analysis of the damage effect of femtosecond-laser irradiation on
extreme
ultraviolet Mo/Si multilayer coating
作者:
M. Suman
a
;
G. Monaco
a
;
b
;
monaco.gianni@gmail.com
;
P. Zuppella
a
;
P. Nicolosi
a
;
b
;
M.G. Pelizzo
a
;
b
;
F. Ferrari
c
;
M. Lucchini
c
;
M. Nisoli
c
关键词:
Extreme
UV
lithography
;
Multilayers
;
Attosecond physics
;
Laser damage
刊名:Thin Solid Films
出版年:2012
7.
Nanometer interface and materials control for multilayer E
UV
-optical applications
作者:
E.
;
Louis
;
;
;
E.Louis@rijnhuizen.nl
;
A.E.
;
Yakshin
;
T.
;
Tsarfati
;
F.
;
Bijkerk
1
关键词:
Review article
;
Multilayer
;
Mo/Si
;
Capping layer
;
Extreme
UV
lithography
刊名:Progress in Surface Science
出版年:2011
8.
Nanometer interface and materials control for multilayer E
UV
-optical applications
作者:
E.
;
Louis
;
;
;
E.Louis@rijnhuizen.nl
;
A.E.
;
Yakshin
;
T.
;
Tsarfati
;
F.
;
Bijkerk
1
关键词:
Review article
;
Multilayer
;
Mo/Si
;
Capping layer
;
Extreme
UV
lithography
刊名:Progress in Surface Science
出版年:2011
9.
An
extreme
ly narrow
UV
pulse generation using a micro- and nano-ring system for pico-lithographic resolution
作者:
S. Chaiyasoonthorn
;
N. Pornsuwancharoen
;
P.P. Yupapin
关键词:
Pico-
lithography
;
Micro-ring resonator
;
Nano-ring resonator
;
Extreme
ly narrow pulse
刊名:Optik - International Journal for Light and Electron Optics
出版年:2010
10.
Negative hybrid sol-gel resist as hard etching mask for pattern transfer with dry etching
作者:
Gianluca Grenci
;
Gioia Della Giustina
;
Aless
;
ro Pozzato
;
Erika Zanchetta
;
Massimo Tormen
;
Giovanna Brusatin
关键词:
Hybrid sol&ndash
;
gel
;
New resist
;
Dry etching
;
X-ray
lithography
;
Patterning
刊名:Microelectronic Engineering
出版年:2012
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