设为首页
收藏本站
网站地图
|
English
|
公务邮箱
About the library
Background
History
Leadership
Organization
Readers' Guide
Opening Hours
Collections
Help Via Email
Publications
Electronic Information Resources
常用资源
电子图书
期刊论文
学位会议
外文资源
特色专题
内部出版物
在“
Elsevier电子期刊
”中,
命中:
3
条,耗时:小于0.01 秒
1.
High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning
作者:
Andreas Finn
;
Bo Lu
;
Robert Kirchner
;
Xaver
Thrun
;
Karola Richter
;
Wolf-Joachim Fischer
关键词:
Nanoimprint
;
Stamp fabrication
;
Soft mold
;
Sticking
;
UV-NIL
;
Working stamp
刊名:Microelectronic Engineering
出版年:2013
2.
15 days electron beam exposure for manufacturing of large area silicon based NIL master
作者:
Xaver
Thrun
;
Kang-Hoon Choi
;
Martin Freitag
;
Manuela Gutsch
;
Christoph Hohle
;
Jan Paul
;
Matthias Rudolph
;
Katja Steidel
关键词:
Nano imprint lithography (NIL)
;
E-beam direct write
;
Silicon master
;
Large area exposure (450
;
cm2)
;
Long time exposure (15
;
days)
;
300
;
mm
;
Rolling mask lithography
;
Roll-2-Roll
刊名:Microelectronic Engineering
出版年:2013
3.
Evaluation of direct patternable inorganic spin-on hard mask materials using electron beam lithography
作者:
Xaver
Thrun
;
Kang-Hoon Choi
;
Martin Freitag
;
Andrew Grenville
;
Manuela Gutsch
;
Christoph Hohle
;
Jason K. Stowers
;
Johann W. Bartha
关键词:
Inorganic resist
;
E-beam direct write
;
Direct patterned spin on hard mask
;
High resolution
;
22
;
nm SRAM
刊名:Microelectronic Engineering
出版年:2012
1
按检索点细分(3)
作者(3)
按出版年细分(3)
2013年(2)
2012年(1)
NGLC 2004-2010.National Geological Library of China All Rights Reserved.
Add:29 Xueyuan Rd,Haidian District,Beijing,PRC. Mail Add: 8324 mailbox 100083
For exchange or info please contact us via
email
.