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内部出版物
CNKI学位论文(3)
知网期刊论文(3)
在“
Elsevier电子期刊
”中,
命中:
5
条,耗时:0.0510021 秒
在所有数据库中总计命中:
6
条
1.
2D and 3D photoresist line
ro
ughness characterization
作者:
Aless
;
ro
Vaglio
Pret
;
Eddy Kunnen
;
Ro
el G
ro
nheid
;
Erwine Pargon
;
Olivier Luere
;
Davide Bianchi
关键词:
Lithography
;
LER
;
LWR
;
CD-SEM
;
CD-AFM
刊名:Mic
ro
elect
ro
nic Engineering
出版年:2013
2.
Linking EUV lithography line edge
ro
ughness and 16 nm NAND memory performance
作者:
Aless
;
ro
Vaglio
Pret
;
Pavel Poliakov
;
Ro
el G
ro
nheid
;
Pieter Blomme
;
Miguel Mir
;
a Corbalan
;
Wim Dehaene
;
Diederik Verkest
;
Jan Van Houdt
;
Davide Bianchi
关键词:
Extreme UV lithography
;
Power spectral density
;
Line edge/width
ro
ughness
;
Er
ro
r correcting code
;
Bit er
ro
r rate
刊名:Mic
ro
elect
ro
nic Engineering
出版年:2012
3.
Mask
ro
ughness impact on extreme UV and 193 nm immersion lithography
作者:
Konstantinos Garidis
;
Aless
;
ro
Vaglio
Pret
;
Ro
el G
ro
nheid
关键词:
EUV
;
LER
;
LWR
;
Frequency analysis
;
P
ro
grammed
ro
ughness
刊名:Mic
ro
elect
ro
nic Engineering
出版年:2012
4.
Prednisone versus tamoxifen in patients with idiopathic ret
ro
peritoneal fib
ro
sis: an open-label randomised cont
ro
lled trial
作者:
Dr Augusto
Vaglio
MD
a
;
augusto.
vaglio
@virgilio.it"" rel=""nofollow
;
Alessandra Palmisano MD
a
;
Federico Alberici MD
a
;
Umberto Maggiore MD
a
;
Stefania Ferretti MD
b
;
Ro
cco Cobelli MD
c
;
Francesco Fer
ro
zzi MD
e
;
Domenico Corradi MD
d
;
Carlo Salvarani MD
f
;
P
ro
f Carlo Buzio MD
a
刊名:The Lancet
出版年:2011
5.
Line Width
Ro
ughness mitigation in chemically amplified resist by post-litho p
ro
cesses
作者:
Aless
;
ro
Vaglio
Pret
;
Ro
el G
ro
nheid
关键词:
LWR
;
Post-litho p
ro
cesses
;
Smoothing techniques
;
PSD
刊名:Mic
ro
elect
ro
nic Engineering
出版年:2010
1
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