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Self-aligned offset gate poly-Si TFTs using photoresist trimming technology
作者:
LongYan Wang (1) (2)
Lei Sun (1)
DeDong Han (1)
Yi Wang (1)
ManSun Chan (3)
ShengDong Zhang (1) (4)
1. Institute of Microelectronics
;
Peking University
;
Beijing
;
100871
;
China
2. BOE Technology Co. Ltd.
;
Beijing
;
100176
;
China
3. Department of Electronic and Computer Engineering
;
Hong Kong University of Science and Technology
;
Hong Kong
;
China
4. School of Electronic and Computer Engineering
;
Peking University
;
Shenzhen
;
518055
;
China
关键词:
photoresist trimming
;
offset
;
polycrystalline silicon (poly
;
Si)
;
thin film transistors (TFTs)
;
042401
刊名:SCIENCE CHINA Information Sciences
出版年:2015
1
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2015年(1)
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