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在“
SpringerLink电子期刊
”中,
命中:
276
条,耗时:小于0.01 秒
在所有数据库中总计命中:
2,563
条
1.
Plasma enhanced chemical vapor deposition of excellent a-Si:H passivation layers for a-Si:H/c-Si heterojunction solar cells at high pressure and high power
作者:
Lei Zhao
;
Wenbin Zhang
;
Jingwei Chen
;
Hongwei Diao
;
Qi Wang…
关键词:
PECVD
;
high pressure and high power
a ;
Si
;
H microstructure
;
passivation
;
heterojunction solar cell
刊名:Frontiers in Energy
出版年:2017
2.
Plasma Impedance Analysis: A Novel Approach for Investigating a Phase Transition from a-Si:H to nc-Si:H
作者:
Deepika Chaudhary
;
Mansi Sharma
;
S. Sudhakar…
关键词:
Plasma impedance
;
27.12 MHz assisted
PECVD
process
;
Transition zone
;
Nano
;
crystalline silicon thin films
刊名:Plasma Chemistry and Plasma Processing
出版年:2017
3.
Fabrication and Characterization of Solar Cells Based on Silicon Nanowire Homojunctions
作者:
H. F. Al-Taay
;
M. A. Mahdi
;
D. Parlevliet
;
P. Jennings
关键词:
Silicon nanowires
;
Solar cells
;
PECVD
刊名:SILICON
出版年:2017
4.
Sputtered AZO Thin Films for TCO and Back Reflector Applications in Improving the Efficiency of Thin Film a-Si:H Solar Cells
作者:
Arokiyadoss Rayerfrancis
;
P. Balaji Bhargav
;
Nafis Ahmed
;
Sekhar Bhattacharya…
关键词:
AZO
a ;
Si
;
H solar cell
;
Back reflector
;
Structural
;
Electrical
;
Optical properties
刊名:SILICON
出版年:2017
5.
X-ray photoelectron study of the effect of the composition of the initial gas phase on changes in the electronic structure of hexagonal boron nitride films obtained by
PECVD
from borazine
作者:
E. A. Il’inchik
;
I. S. Merenkov
关键词:
hexagonal boron nitride
X ;
ray photoelectron spectroscopy
;
electronic structure
;
thin films
;
PECVD
;
borazine
;
nanowalls
刊名:Journal of Structural Chemistry
出版年:2016
6.
Nanocrystalline silicon thin film prepared by e-beam evaporation for display application
作者:
Prachi Sharma
;
Nishant Tripathi…
刊名:Journal of Materials Science: Materials in Electronics
出版年:2017
7.
Selective and uniform growth of single-wall carbon nanotubes (SWCNTs) for gas sensing application
作者:
M. A. Alvi
;
A. A. Al-Ghamdi
;
Shamshad A. Khan
刊名:Applied Physics A
出版年:2017
8.
Surface roughness analysis of SiO2 for
PECVD
, PVD and IBD on different substrates
作者:
Muhammad Rizwan Amirzada
;
Andreas Tatzel
;
Volker Viereck…
关键词:
Micro electro mechanical systems
;
Plasma
;
enhanced chemical vapor deposition
;
Physical vapor deposition
;
Ion beam deposition
;
Surface roughness
;
Stylus profilometry
;
Atomic force microscopy
刊名:Applied Nanoscience
出版年:2016
9.
Space–Time Coupled Finite Element Simulation of
PECVD
Reactor
作者:
Z. Dehghanifard
;
A. R. Ahmadi
;
A. R. Ganjovi…
刊名:International Journal of Applied and Computational Mathematics
出版年:2016
10.
Effect of RF power and gas flow ratio on the growth and morphology of the
PECVD
SiC thin film s for MEMS applications
作者:
BHAVANA PERI
;
BIKASH BORAH
;
RAJ KISHORA DASH
关键词:
PECVD
;
SiC
;
thin films
;
morphology
;
MEMS
刊名:Bulletin of Materials Science
出版年:2015
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