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SpringerLink电子期刊(13)
NATURE电子期刊(2)
ACS电子期刊(20)
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Elsevier电子期刊(76)
在“
Elsevier电子期刊
”中,
命中:
76
条,耗时:0.1229419 秒
在所有数据库中总计命中:
112
条
1.
On the spatial resolution limit of
direct
-
write
electron
beam
lithography
作者:
Nan Jiang
关键词:
Direct
-
write
electron
beam
lithography
;
Scanning transmission
electron
microscopy
;
Electric field
;
Spatial resolution
刊名:Micro
electron
ic Engineering
出版年:2017
2.
Fabrication of the CALDER light detectors
作者:
I. Colantoni
a
;
b
;
colanton@roma1.infn.it" class="auth_mail" title="E-mail the corresponding author
;
F. Bellini
a
;
c
;
L. Cardani
a
;
d
;
N. Casali
a
;
c
;
M.G. Castellano
b
;
A. Coppolecchia
a
;
C. Cosmelli
a
;
c
;
A. Cruciani
a
;
c
;
A. D׳Addabbo
e
;
S. Di Domizio
f
;
g
;
M. Martinez
a
;
C. Tomei
c
;
M. Vignati
a
;
c
关键词:
KIDs
;
Cryogenic
;
Superconductor
刊名:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
出版年:2016
3.
Electron
-
beam
writing of deoxygenated micro-patterns on graphene oxide film
作者:
Kuang-Hsu Wu
a
;
1
;
Han-Hao Cheng
b
;
1
;
Ali Amdad Mohammad
a
;
Idriss Blakey
b
;
Kevin Jack
c
;
Ian R. Gentle
a
;
Da-Wei Wang
a
;
d
;
da-wei.wang@unsw.edu.au" class="auth_mail" title="E-mail the corresponding author
刊名:Carbon
出版年:2015
4.
Self-aligned
electron
beam
lithography of metallic layer sandwiched in a polymer multilayer: Facilitation of vertical organic transistor fabrication
作者:
Mihir Sarkar
;
Y.N. Mohapatra
关键词:
Electron
beam
lithography
;
Multilayer patterning
;
Vertical organic transistor
刊名:Micro
electron
ic Engineering
出版年:1 March, 2014
5.
Image based in situ
electron
-
beam
drift detection by silicon photodiodes in scanning-
electron
microscopy and an
electron
-
beam
lithography system
作者:
Yi-Hung Kuo
a
;
Cheng-Ju Wu
a
;
Fu-Tsun Kuo
a
;
Jia-Yush Yen
a
;
jyen@ntu.edu.tw
;
Yung-Yaw Chen
b
关键词:
Electron
-
beam
lithography
;
Electron
-
beam
drift
;
Back scattered
electron
;
Electron
detectors
刊名:Micro
electron
ic Engineering
出版年:2013
6.
Evaluation of
direct
patternable inorganic spin-on hard mask materials using
electron
beam
lithography
作者:
Xaver Thrun
;
Kang-Hoon Choi
;
Martin Freitag
;
Andrew Grenville
;
Manuela Gutsch
;
Christoph Hohle
;
Jason K. Stowers
;
Johann W. Bartha
关键词:
Inorganic resist
;
E-
beam
direct
write
;
Direct
patterned spin on hard mask
;
High resolution
;
22
;
nm SRAM
刊名:Micro
electron
ic Engineering
出版年:2012
7.
Design and fabrication of a polymer micro ring resonator with novel optical material at add/drop geometry using laser
beam
direct
write
lithography technique
作者:
Abbas Madani
c
;
a.madani@ifw-dresden.de
;
Abbas.Madani@elis.ugent.be
;
Hamidreza Azarinia
a
;
Hamidreza.AzariNia@elis.ugent.be
;
Hamid Latifi
b
;
latifi@sbu.ac.ir
关键词:
Lithography
;
Micro Ring Resonator
;
Optical polymer
;
Tapered fiber
刊名:Optik - International Journal for Light and
Electron
Optics
出版年:2013
8.
Sub-25 nm
direct
write
(maskless) X-ray nanolithography
作者:
Adam F.G. Leontowich
a
;
adam.leontowich@cfel.de
;
Adam P. Hitchcock
a
;
Ben Watts
b
;
Jö
;
rg Raabe
b
关键词:
Maskless lithography
;
STXM
;
Fresnel zone plate
;
X-ray lithography
;
Cold development
刊名:Micro
electron
ic Engineering
出版年:2013
9.
Direct
writing via
electron
-driven reactions
作者:
Seung Whan Lee
1
;
2
;
R. Mohan Sankaran
1
;
mohan@case.edu
刊名:Materials Today
出版年:2013
10.
15 days
electron
beam
exposure for manufacturing of large area silicon based NIL master
作者:
Xaver Thrun
;
Kang-Hoon Choi
;
Martin Freitag
;
Manuela Gutsch
;
Christoph Hohle
;
Jan Paul
;
Matthias Rudolph
;
Katja Steidel
关键词:
Nano imprint lithography (NIL)
;
E-
beam
direct
write
;
Silicon master
;
Large area exposure (450
;
cm2)
;
Long time exposure (15
;
days)
;
300
;
mm
;
Rolling mask lithography
;
Roll-2-Roll
刊名:Micro
electron
ic Engineering
出版年:2013
1
2
3
4
5
6
7
8
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