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CNKI学位论文(1)
在“
ACS电子期刊
”中,
命中:
5
条,耗时:小于0.01 秒
在所有数据库中总计命中:
1
条
1.
Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Using a Zero-Oxidation State Precursor
作者:
Dustin Z. AustinMelanie A. Jenkins
;
Derryl Allman
;
Sallie Hose
;
David Price
;
Charles
L.
Dezelah
;
John F. Conley Jr.
刊名:Chemistry of Materials
出版年:2017
2.
Role of Initial Precursor Chemisorption on Incubation Delay for Molybdenum Oxide Atomic Layer Deposition
作者:
Charith E. Nanayakkara
;
Abraham Vega
;
Guo Liu
;
Charles
L.
Dezelah
;
Ravindra K. Kanjolia
;
Yves J. Chabal
刊名:Chemistry of Materials
出版年:2016
3.
A Pyrazolate-Based Metalorganic Tantalum Precursor That Exhibits High Thermal Stability and Its Use in the Atomic Layer Deposition of Ta2O5
作者:
Charles
L.
Dezelah
IV
;
Monika K. Wiedmann
;
Kenichiro Mizohata
;
Ronald J. Baird
;
Lauri Niinistö
;
Charles
H. Winter
刊名:Journal of the American Chemical Society
出版年:2007
4.
Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W2(NMe2)6 and Water: Precursor-Based Control of Oxidation State in the Thin Film Material
作者:
Charles
L.
Dezelah
IV
;
Oussama M. El-Kadri
;
Imre M. Szilá
;
gyi
;
Joseph M. Campbell
;
Kai Arstila
;
Lauri Niinistö
;
Charles
H. Winter
刊名:Journal of the American Chemical Society
出版年:2006
5.
Atomic Layer Deposition of Ga2O3 Films from a Dialkylamido-Based Precursor
作者:
Charles
L.
Dezelah
;
IV
;
Jaakko Niinistö
;
Kai Arstila
;
Lauri Niinistö
;
and
Charles
H. Winter
刊名:Chemistry of Materials
出版年:2006
1
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